Title:
PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, LIGHT EXPOSURE METHOD AND METHOD FOR PRODUCING DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/054131
Kind Code:
A1
Abstract:
This phase shift mask blank comprises a substrate and a phase shift layer that is formed on the substrate; the phase shift layer contains chromium and oxygen; and the surface of the phase shift layer has an arithmetic mean height of 0.38 nm or more.
Inventors:
OZAWA TAKASHI (JP)
TAKARADA YOHEI (JP)
HAYASHI KENTO (JP)
YAGAMI TAKASHI (JP)
TAKARADA YOHEI (JP)
HAYASHI KENTO (JP)
YAGAMI TAKASHI (JP)
Application Number:
PCT/JP2019/019862
Publication Date:
March 19, 2020
Filing Date:
May 20, 2019
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F1/32; C23C14/06; G03F1/54
Foreign References:
| JP2016153889A | 2016-08-25 | |||
| JP2018116263A | 2018-07-26 | |||
| JP2018091889A | 2018-06-14 | |||
| JP2017181545A | 2017-10-05 | |||
| JP2017033004A | 2017-02-09 | |||
| JP2007279214A | 2007-10-25 |
Attorney, Agent or Firm:
NAGAI, Fuyuki et al. (JP)
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