Title:
PHENOL RESIN FOR PHOTORESIST, PHOTORESIST COMPOSITION CONTAINING SAME, AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2010/050592
Kind Code:
A1
Abstract:
Disclosed is a phenol resin for photoresists, which enables high resolution, while having high flexibility, high heat resistance and high sensitivity. Also disclosed are a photoresist composition containing the phenol resin for photoresists, and a method for producing the phenol resin for photoresists.
The phenol resin for photoresists is characterized by being obtained by condensing (a) a methyl phenol containing at least one of meta-cresol and para-cresol, and (b) a dialdehyde containing at least one of glutaraldehyde and adipaldehyde.
Inventors:
YAMASAKI HIROHITO (JP)
ISHIGUCHI KOUJI (JP)
ISHIGUCHI KOUJI (JP)
Application Number:
PCT/JP2009/068688
Publication Date:
May 06, 2010
Filing Date:
October 30, 2009
Export Citation:
Assignee:
INST NAT COLLEGES TECH JAPAN (JP)
MEIWA PLASTIC IND LTD (JP)
YAMASAKI HIROHITO (JP)
ISHIGUCHI KOUJI (JP)
FURUMOTO TAKAHISA (JP)
MEIWA PLASTIC IND LTD (JP)
YAMASAKI HIROHITO (JP)
ISHIGUCHI KOUJI (JP)
FURUMOTO TAKAHISA (JP)
International Classes:
C08G8/04; G03F7/023; H01L21/027
Foreign References:
| JPH03199221A | 1991-08-30 | |||
| JPS5765716A | 1982-04-21 | |||
| JPH03501268A | 1991-03-22 | |||
| JPH0656949A | 1994-03-01 | |||
| JP2001048959A | 2001-02-20 | |||
| JP2006509889A | 2006-03-23 |
Attorney, Agent or Firm:
ITAMI, Masaru et al. (JP)
Itami 勝 (JP)
Itami 勝 (JP)
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