PHOTO-ALIGNING EXPOSURE DEVICE

WIPO Patent Application WO/2019/031453

A1

The purpose of the present invention is to provide a photo-aligning exposure device which performs diagonal exposure in order to develop a pretilt angle, wherein an inexpensive scattering light source (volume light source) can be used and a uniform illuminance distribution can be obtained with a compact configuration. This photo-aligning exposure device (1) that performs a photo-alignment process by scanning and exposing, in one direction, a surface to be illuminated, is provided with: a light source (2) which emits scattered light toward a surface (10S) to be illuminated; an optical filter (3) which selectively emits ultraviolet rays in the light emitted from the light source (2); and an irradiation angle restriction member (4) which selectively emits light applied diagonally relative to the scanning direction, among light emitted from the optical filter (3), wherein the irradiation angle restriction member (4) has a plurality of flat-plate-shaped light direction restriction plates (40) that are arrayed at predetermined intervals along the scanning direction so as to be parallel to each other and tilted at a certain angle relative to the surface (10S) to be illuminated.

YOSHIDA YUJI (JP)
IKEDA SATOSHI (JP)
ARAI TOSHINARI (JP)
MIYAKE ISAMU (JP)
KATAYAMA TAKASHI (JP)
HIRAI AKIRA (JP)

PCT/JP2018/029427

February 14, 2019

August 06, 2018

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V TECH CO LTD (JP)
SHARP KK (JP)

G03F7/20; G02F1/13; G02F1/1337

WO2016133103A1

2016-08-25

JP2005234266A	2005-09-02
JP2006323060A	2006-11-30
JP2015055647A	2015-03-23
JP2014013277A	2014-01-23
JP2004163881A	2004-06-10
JP2004144884A	2004-05-20

EICHI PATENT & TRADEMARK CORP. (JP)

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