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Title:
PHOTO-MASK DEVICE FOR PHOTO-ALIGNMENT, AND APPLICATION EQUIPMENT
Document Type and Number:
WIPO Patent Application WO/2016/173029
Kind Code:
A1
Abstract:
A photo-mask device for photo-alignment, and application equipment, comprising a first photo-mask (210) and a second photo-mask (220) which are partially overlapped with each other so as to enable the first photo-mask (210) and the second photo-mask (220) to respectively comprise a first overlap region (2101) and a first non-overlap region (2102) as well as a second overlap region (2201) and a second non-overlap region (2202), and the first overlap region (2101), the first non-overlap region (2102), the second overlap region (2201) and the second non-overlap region (2202) respectively comprising a plurality of opening parts (2103, 2104, 2203, 2204); and the heights of the opening parts (2103) of the first overlap region and the heights of the opening parts (2203) of the second overlap region separately change smoothly according to a trigonometric function square, and the heights of the opening parts of the overlap regions are equal to those of the opening parts of the first or second non-overlap region after the overlap regions are overlapped at the same positions. The photo-mask device can eliminate a strip-shaped mura defect in a subsequent technology, thereby improving display quality of a product.

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Inventors:
HAN BING (CN)
SHIH MING-HUNG (CN)
LI MENG (CN)
Application Number:
PCT/CN2015/079703
Publication Date:
November 03, 2016
Filing Date:
May 25, 2015
Export Citation:
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Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
International Classes:
G02F1/1337; G03F7/20
Foreign References:
CN102298235A2011-12-28
CN102830592A2012-12-19
CN103869547A2014-06-18
CN102687078A2012-09-19
US20030025864A12003-02-06
Attorney, Agent or Firm:
CHINA WISPRO INTELLECTUAL PROPERTY LLP. (CN)
深圳市威世博知识产权代理事务所（普通合伙） (CN)
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