Title:
PHOTOACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING DEVICE USING SAID RESIST COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2023/053877
Kind Code:
A1
Abstract:
Provided are: a compound suitable for use as a photodisintegrable base for resist compositions which have satisfactory sensitivity to actinic energy, e.g., EB or EUV, have excellent resolution in lithography, and can give fine patterns reduced in line width roughness (LWR); and a resist composition containing the compound. The photoacid generator according to the present invention comprises an onium salt compound of formula (1). (In formula (1), R1 and R2 are each independently one selected from the group consisting of a hydrogen atom, an optionally substituted, linear, branched, or cyclic, C1-C30 alkyl group, an optionally substituted, linear, branched, or cyclic, C2-C30 alkenyl group, an optionally substituted, C5-C30 aryl group, and an optionally substituted, C3-C30 heteroaryl group, at least either thereof is not a hydrogen atom; when the R1 and the R2 have methylene groups, then at least one of the methylene groups of the R1 and R2 may have been replaced by a divalent group containing a heteroatom, the R1 and the R2 may be bonded to each other directly by a single bond or via an atom or group selected from the group consisting of an oxygen atom, a sulfur atom, a nitrogen-atom-containing group, a methylene group, and a carbonyl group, thereby forming a ring structure together with the nitrogen atom bonded thereto, at least the R1 or the R2 has at least one halogen atom, and when there are two or more of the halogen atoms, then they may be different; L is a divalent linking group represented by –(CF2)n-; n is an integer of 1 or larger; and M+ is a monovalent onium cation.)
Inventors:
KAMAKURA TAKAHIRO (JP)
SOTOME TAKUO (JP)
HARA DAISUKE (JP)
SOTOME TAKUO (JP)
HARA DAISUKE (JP)
Application Number:
PCT/JP2022/033590
Publication Date:
April 06, 2023
Filing Date:
September 07, 2022
Export Citation:
Assignee:
TOYO GOSEI CO LTD (JP)
International Classes:
C07C233/15; C07C231/12; C07C381/12; C07D211/34; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| WO2019087626A1 | 2019-05-09 |
Foreign References:
| JP2013200561A | 2013-10-03 |
Attorney, Agent or Firm:
SK INTELLECTUAL PROPERTY LAW FIRM et al. (JP)
Download PDF:
Previous Patent: METHOD AND DEVICE FOR ANALYZING IONIC COMPONENTS IN ULTRAPURE WATER
Next Patent: TOGGLE CLAMP
Next Patent: TOGGLE CLAMP