Title:
PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
Document Type and Number:
WIPO Patent Application WO2000010056
Kind Code:
A9
Abstract:
This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that generate an anthracene acid upon exposure to activating radiation, particularly anthracene sulfonic acids such as acids that include 9,10-dialkoxyanthracene-2-sulfonate moieties. Positive- and negative-acting chemically amplified resists that contain such PAGs and that are imaged with I-line (365 nm) radiation are particularly preferred.
Inventors:
CAMERON JAMES F (US)
Application Number:
PCT/US1999/018307
Publication Date:
June 08, 2000
Filing Date:
August 13, 1999
Export Citation:
Assignee:
SHIPLEY CO LLC (US)
CAMERON JAMES F (US)
CAMERON JAMES F (US)
International Classes:
G03F7/004; G03F7/038; G03F7/039; (IPC1-7): G03C1/492; G03C5/00
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