PHOTOACTIVE MONOMER, PHOTOSENSITIVE POLYMER AND CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION INCLUDING THE SAME

Title:

PHOTOACTIVE MONOMER, PHOTOSENSITIVE POLYMER AND CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION INCLUDING THE SAME

Document Type and Number:

WIPO Patent Application WO/2005/109102

Kind Code:

A1

Abstract:

Disclosed are a novel (meth)acrylic monomer having the function of a photoacid generator, a photosensitive polymer prepared with the monomer, and a chemically amplified photoresist composition including the polymer. The monomer have a merit in that the photoacid-generator does not elute from a photoresist during wet exposing process in immersion lithography. Thus, the contaminations of lens and immersion fluid used in wet exposing process can be prevented or reduced.

Inventors:

LEE JAE-WOO (KR)
KIM DEOG-BAE (KR)
KIM JAE-HYUN (KR)

Application Number:

PCT/KR2005/001370

Publication Date:

November 17, 2005

Filing Date:

May 11, 2005

Export Citation:

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Assignee:

DONGJIN SEMICHEM CO LTD (KR)
LEE JAE-WOO (KR)
KIM DEOG-BAE (KR)
KIM JAE-HYUN (KR)

International Classes:

C07C381/12; G03F7/004; G03F7/039; (IPC1-7): G03F7/039

Foreign References:

US6713612B2	2004-03-30
US6692893B2	2004-02-17
US6664022B1	2003-12-16
US6482567B1	2002-11-19

Attorney, Agent or Firm:

Lee, Sang-hun (Geun-yeong Bldg., 735-32, Yeoksam-dong,, Gangnam-g, Seoul 135-923, KR)

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