Title:
PHOTOCURABLE COMPOSITION FOR FILM FORMATION
Document Type and Number:
WIPO Patent Application WO/2022/202005
Kind Code:
A1
Abstract:
[Problem] To provide a photocurable composition that can be applied to a film. [Solution] A photocurable composition comprising the following components (a) to (d), wherein the content of component (a) is 80-99 parts by mass per 100 parts by mass of the total content of components (a) to (d), and the viscosity at 25.0°C is 1-50 mPa·s. (a) At least one monofunctional or polyfunctional (meth)acrylate having one or more (meth)acryloyloxy groups per molecule (excluding component (d) below); (b) a photoradical initiator; (c) silica particles that are surface-modified with at least one silane coupling agent and have a primary particle size of 1-100 nm; and (d) a polyrotaxane having a (meth)acryloyloxy group.
Inventors:
IDENO YUZUKO (JP)
OTAKE YOSUKE (JP)
OTAKE YOSUKE (JP)
Application Number:
PCT/JP2022/006464
Publication Date:
September 29, 2022
Filing Date:
February 17, 2022
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
C08F251/00; B29C59/02; C08F290/06; C08F290/14; C08K5/13; C08K5/37; C08K5/372; C08K9/06; C08L51/00
Domestic Patent References:
| WO2016194988A1 | 2016-12-08 | |||
| WO2016171187A1 | 2016-10-27 | |||
| WO2020255829A1 | 2020-12-24 | |||
| WO2020003863A1 | 2020-01-02 |
Foreign References:
| JP2020015827A | 2020-01-30 | |||
| JP2018501191A | 2018-01-18 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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