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Title:
PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING MOLDED ARTICLE HAVING SURFACE MICROPATTERN
Document Type and Number:
WIPO Patent Application WO/2010/090269
Kind Code:
A1
Abstract:
Provided is a photocurable composition, which is capable of forming a cured product having excellent environmental properties and mold release performance and has excellent compatibility with fluorosurfactants and other components. Also provided is a method with which it is possible to produce a molded article having a surface micropattern obtained by precise transfer of a mold inverted pattern and having a uniform surface composition. A photocurable composition for imprinting comprises as the primary component a compound having one or more acryloyloxy or methacryloyloxy groups. The photocurable composition contains polymer (D). Polymer (D) is a polymer having a mass-average molecular weight of 1,000 to 5,000 and contains 20 to 45 mass% of CH2=C(R11)-C(O)O-Q-Rf units, 20 to 65 mass% of CH2=C(R21)-C(O)O-(CH2CH(R22)O)n-H units (number-average molecular weight of 350 or less), and 5 to 40 mass% of CH2=C(R31)-C(O)O-R32 units. R11, R21, and R31 are hydrogen atoms or methyl groups, Q is a bivalent linking group, or the like, Rf is a C1-6 polyfluoroalkyl group, R22 is a hydrogen atom, or the like, n is between 3 and 6, and R32 is a C2-15 aliphatic hydrocarbon group.

Inventors:
FUJIE AYAKO (JP)
KAWAGUCHI YASUHIDE (JP)
NAKAYAMA FUMIKO (JP)
Application Number:
PCT/JP2010/051634
Publication Date:
August 12, 2010
Filing Date:
February 04, 2010
Export Citation:
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Assignee:
ASAHI GLASS CO LTD (JP)
FUJIE AYAKO (JP)
KAWAGUCHI YASUHIDE (JP)
NAKAYAMA FUMIKO (JP)
International Classes:
H01L21/027; B29C59/02; C08F220/28; B29K33/04
Domestic Patent References:
WO2006114958A12006-11-02
Foreign References:
JP2006182880A2006-07-13
JP2006114882A2006-04-27
JP2004523906A2004-08-05
JP2004071934A2004-03-04
JP2004051790A2004-02-19
JP2002012796A2002-01-15
JP2001106710A2001-04-17
Attorney, Agent or Firm:
SENMYO, Kenji et al. (JP)
Spring name Kenji (JP)
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