Title:
PHOTOCURABLE COMPOSITION AND METHODS FOR OPTICAL COMPONENT BY USING THE SAME
Document Type and Number:
WIPO Patent Application WO/2014/208064
Kind Code:
A1
Abstract:
In an imprint method in a condensable gas atmosphere, the force (mold releasing force) required to separate a mold from a resist cured film (mold release) has been large. A photocurable composition for performing imprint in an atmosphere containing a condensable gas includes a component (A) which is a (meth)acrylate monomer; a component (B) which is a photopolymerization initiator; and a component (C) which is a mold releasing agent. The saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 50% by weight or more, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm.
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Inventors:
HONMA TAKESHI (JP)
ITO TOSHIKI (JP)
YONEZAWA SHIORI (JP)
CHIBA KEIKO (JP)
YAMASHITA KEIJI (JP)
ITO TOSHIKI (JP)
YONEZAWA SHIORI (JP)
CHIBA KEIKO (JP)
YAMASHITA KEIJI (JP)
Application Number:
PCT/JP2014/003311
Publication Date:
December 31, 2014
Filing Date:
June 19, 2014
Export Citation:
Assignee:
CANON KK (JP)
International Classes:
B29C59/02; H01L21/027; C08F2/44; C08F2/50
Domestic Patent References:
| WO2013035761A1 | 2013-03-14 |
Foreign References:
| US20120306122A1 | 2012-12-06 | |||
| JP3700001B2 | 2005-09-28 | |||
| JP2013168645A | 2013-08-29 | |||
| JP2014033082A | 2014-02-20 |
Other References:
See also references of EP 3000122A4
Attorney, Agent or Firm:
ABE, Takuma et al. (30-2Shimomaruko 3-chome, Ohta-k, Tokyo 01, JP)
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