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Title:
PHOTOCURABLE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2015/008709
Kind Code:
A1
Abstract:
　Provided is a rapid-curing photocurable composition having excellent processability and being capable of photocuring in a short period of time even with low cumulative luminous energy. The composition contains (A) a cross-linking silicon group-containing organic polymer, (B) a photobase-generating agent, and (C1) a silicon compound having a Si-F bond and/or (C2) one or more fluoride compounds selected from the group consisting of boron trifluoride, a boron trifluoride complex, and an alkali metal salt of a fluorinating agent and a multivalent fluoro compound. The (B) photobase-generating agent is preferably a photolatent tertiary amine.

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Inventors:
YAMAGA HIROSHI (JP)
OKAMURA NAOMI (JP)
WATANABE YUTAKA (JP)
ASAI RYOSUKE (JP)
KOUNO SHOUMA (JP)
SAITO ATSUSHI (JP)
Application Number:
PCT/JP2014/068615
Publication Date:
January 22, 2015
Filing Date:
July 11, 2014
Export Citation:
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Assignee:
CEMEDINE CO LTD (JP)
International Classes:
C08K5/16; C08L101/10; C08K5/54; C09D183/00; C09J183/00
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WO2012133443A12012-10-04
WO2006051799A12006-05-18
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Other References:
J.P. KENNEDY ET AL., J. POLYMER SCI., POLYMER CHEM. ED., vol. 15, 1997, pages 2843
ISHIKAWA, ORGANOMETALLICS, vol. 15, 1996, pages 2478
See also references of EP 3023462A4
Attorney, Agent or Firm:
ISHIHARA, Shinsuke et al. (JP)
Shinsuke Ishihara (JP)
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