Title:
PHOTOCURABLE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2021/182464
Kind Code:
A1
Abstract:
The present invention aims to provide a photocurable composition that can form a cured product that has good adhesion to an inorganic base material and good ion migration resistance. The photocurable composition contains: 40%–80% by mass of a monofunctional acrylic monomer (A), relative to 100% by mass of the composition; 10%–50% by mass of a multifunctional acrylic monomer (B) relative to 100% by mass of the composition; and 0.1%–30% by mass of a hydroxyl number adjustment agent (C), relative to 100% by mass of the composition. The hydroxyl number for the composition is 1–100 mg KOH/g.
More Like This:
| WO/2024/018991 | LACTIC ACID-VINYL COPOLYMER, BINDER COMPOSITION, AND PASTE FOR USE IN SINTERING |
| WO/2021/211263 | AQUEOUS DISPERSION OF MULTISTAGE ACRYLIC MICROSPHERES |
| JP2024053746 | Resin compositions and films |
Inventors:
KIKUCHI AYAKO (JP)
KOJIMA SHUNGO (JP)
YOSHITOMI KOHSUKE (JP)
TAKAHASHI YUKA (JP)
SUGIHARA KATSUYUKI (JP)
KOJIMA SHUNGO (JP)
YOSHITOMI KOHSUKE (JP)
TAKAHASHI YUKA (JP)
SUGIHARA KATSUYUKI (JP)
Application Number:
PCT/JP2021/009263
Publication Date:
September 16, 2021
Filing Date:
March 09, 2021
Export Citation:
Assignee:
JNC CORP (JP)
International Classes:
C08F265/06; C08F2/44; C09D11/30
Domestic Patent References:
| WO2015080155A1 | 2015-06-04 |
Foreign References:
| JP2017019989A | 2017-01-26 | |||
| JP2017122199A | 2017-07-13 |
Attorney, Agent or Firm:
OKUBO, Katsuyuki (JP)
Download PDF: