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Title:
PHOTOCURABLE RESIN COMPOSITION AND 3D STEREOLITHOGRAPHY PRODUCT USING SAME
Document Type and Number:
WIPO Patent Application WO/2020/170990
Kind Code:
A1
Abstract:
The photocurable resin composition includes a reactive monomer, a reactive oligomer, and a photopolymerization initiator. The glass transition point of a cured product of the reactive monomer is less than 20°C, and the glass transition point of a cured product of the reactive oligomer is less than 20°C. The loss tangent tanδ of a cured product of the photocurable resin composition at 25°C is 0.2 or lower. The elongation at break according to ASTM D638 of a cured product of the photocurable resin composition is 150% or higher.

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Inventors:
WATANABE KOJI (JP)
OZOE HIROAKI (JP)
Application Number:
PCT/JP2020/005904
Publication Date:
August 27, 2020
Filing Date:
February 14, 2020
Export Citation:
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Assignee:
NAGASE CHEMTEX CORP (JP)
International Classes:
C08F290/06; B29C64/314; C08F2/44; C08F2/50
Domestic Patent References:
WO2017047615A12017-03-23
WO2019035387A12019-02-21
Foreign References:
JP2016065212A2016-04-28
JP2016112824A2016-06-23
JP2019099750A2019-06-24
Other References:
See also references of EP 3929224A4
Attorney, Agent or Firm:
KAWASAKI, HASHIMOTO AND PARTNERS (JP)
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