Title:
PHOTOCURABLE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2015/181984
Kind Code:
A1
Abstract:
Provided is a short setting-time photocurable resin composition having a high refractive index and high transparency. A photocurable resin composition containing a specific fluorene compound as component (A), a monofunctional (meth)acrylate having an alicyclic hydrocarbon group as component (B), a monofunctional (meth)acrylate having one aromatic ring as component (C), and a photo-radical polymerization initiator as component (D), the content of component (A) being 10-70 parts by mass, the content of component (B) being 5-65 parts by mass, and the content of component (C) being 5-65 parts by mass per 100 total parts by mass of components (A)-(C).
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Inventors:
GOTO YOSHITSUGU (JP)
FUKAO KENJI (JP)
HOSHINO TAKAKO (JP)
YODA KIMIHIKO (JP)
FUKAO KENJI (JP)
HOSHINO TAKAKO (JP)
YODA KIMIHIKO (JP)
Application Number:
PCT/JP2014/064534
Publication Date:
December 03, 2015
Filing Date:
May 30, 2014
Export Citation:
Assignee:
DENKI KAGAKU KOGYO KK (JP)
International Classes:
C08F220/30; B32B27/30; C09J4/02; C09J11/06; G02B1/11
Domestic Patent References:
WO2013022065A1 | 2013-02-14 |
Foreign References:
JP2012140551A | 2012-07-26 | |||
JP2013181077A | 2013-09-12 | |||
JP2013227392A | 2013-11-07 | |||
JP2010248358A | 2010-11-04 | |||
JP2006152115A | 2006-06-15 | |||
JP2014108983A | 2014-06-12 |
Attorney, Agent or Firm:
SK INTELLECTUAL PROPERTY LAW FIRM et al. (JP)
SK patent business corporation (JP)
SK patent business corporation (JP)
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