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Patent Searching and Data


Title:
PHOTOCURING RESIN COMPOSITION, FOR 3D PRINTER, HAVING EXCELLENT WATER RESISTANCE
Document Type and Number:
WIPO Patent Application WO/2022/045576
Kind Code:
A1
Abstract:
The present invention relates to a photocuring resin composition having excellent water resistance. The photocuring resin composition has enhanced flexural strength due to enhanced flexural strength and absorbability, has water resistance and dimensional stability, and exhibits excellent workability and enables enhanced physical properties of the printed result when used for producing a 3D printed material by means of an SLA, DLP or LCD method. Also, the present invention relates to a photocuring resin composition, having excellent water resistance, which can be usefully and generally employed as a material for domestic and commercial 3D printers.

Inventors:
SIM UN SEOB (KR)
Application Number:
PCT/KR2021/008880
Publication Date:
March 03, 2022
Filing Date:
July 12, 2021
Export Citation:
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Assignee:
GRAPHY INC (KR)
International Classes:
B33Y70/10; C08F2/48; C08F2/44; C08F2/50; C08F290/00; C08K3/22
Foreign References:
JPH10279819A1998-10-20
KR20200056452A2020-05-22
CN110358020A2019-10-22
KR20190034913A2019-04-03
KR102067533B12020-02-11
Attorney, Agent or Firm:
WON, Dae Gyu (KR)
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