Title:
PHOTOGRAPHIC DEVELOPER COMPOSITION FOR PHOTOSENSITIVE ORGANIC FILM
Document Type and Number:
WIPO Patent Application WO/2007/099925
Kind Code:
A1
Abstract:
Disclosed is a photographic developer composition for a photosensitive organic film (mainly, a photoresist), which has an excellent anticorrosion property against Al and a good developing property. The photographic developer composition comprises 0.5 to 5% by weight of a tetraalkylammonium hydroxide, 10 to 40% by weight of a sugar alcohol such as sorbitol or xylitol and 3 to 19% by weight of a water-soluble organic solvent such as a sulfoxide, a glycol ether or an amide, with the remainder being water. The composition is characterized in that the ratio between a dissolution rate at a light-exposed area and a dissolution rate at a light-unexposed area on a photosensitive organic film (mainly, a photoresist) is 50 or greater.
Inventors:
YASUE HIDEKUNI (JP)
NISHIJIMA YOSHITAKA (JP)
KIDO SHUSAKU (JP)
NISHIJIMA YOSHITAKA (JP)
KIDO SHUSAKU (JP)
Application Number:
PCT/JP2007/053568
Publication Date:
September 07, 2007
Filing Date:
February 27, 2007
Export Citation:
Assignee:
NAGASE CHEMTEX CORP (JP)
NEC LCD TECHNOLOGIES LTD (JP)
YASUE HIDEKUNI (JP)
NISHIJIMA YOSHITAKA (JP)
KIDO SHUSAKU (JP)
NEC LCD TECHNOLOGIES LTD (JP)
YASUE HIDEKUNI (JP)
NISHIJIMA YOSHITAKA (JP)
KIDO SHUSAKU (JP)
International Classes:
G03F7/32; H01L21/027
Foreign References:
| JP2005208329A | 2005-08-04 | |||
| JP2003167342A | 2003-06-13 |
Attorney, Agent or Firm:
FURUTANI, Shinya (1-27 Dojima 2-chome, Kita-k, Osaka-shi Osaka 03, JP)
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