Title:
PHOTOMASK, AND ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF
Document Type and Number:
WIPO Patent Application WO/2021/012311
Kind Code:
A1
Abstract:
Provided is a photomask, comprising: a main pattern region comprising a first subcircuit pattern positioned at one end thereof and a second subcircuit pattern positioned at the other end thereof; a first virtual circuit pattern adjacent to the first subcircuit pattern; and a second virtual circuit pattern adjacent to the second subcircuit pattern, wherein the first virtual circuit pattern and the first subcircuit pattern have the same aspect ratio and equivalent areas, and the second virtual circuit pattern and the second subcircuit pattern have the same aspect ratio and equivalent areas.
Inventors:
CHEN FANGFU (CN)
Application Number:
PCT/CN2019/099211
Publication Date:
January 28, 2021
Filing Date:
August 05, 2019
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
G03F1/00
Foreign References:
| TW200924062A | 2009-06-01 | |||
| TW200924062A | 2009-06-01 | |||
| CN101043006A | 2007-09-26 | |||
| US20090258302A1 | 2009-10-15 |
Attorney, Agent or Firm:
ESSEN PATENT & TRADEMARK AGENCY (CN)
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