PHOTOMASK CONTAINER

WIPO Patent Application WO/2022/039254

A1

The present invention provides a photomask container that can firmly hold a photomask substrate, suppresses condensation of a photomask substrate accommodation part, provides an excellent level of cleanliness, does not easily allow the adherence of debris (fine particles) to the surface of the photomask substrate, and is lightweight and has a superior level of mechanical strength.　The photomask substrate accommodation part is formed via a container body and a lid body, and the photomask container is used to store and transport the photomask substrate in a state of being accommodated in the photomask substrate accommodation part. The photomask container is characterized in that the container body is a box-shaped body formed from a high-density polyethylene resin having a melt flow rate (MFR) of 0.6 (g/10 min) or less and comprises a substantially planar-shaped base section and a side wall section installed in a direction substantially perpendicular from an end part of the base section, and is a two-layer hollow structure comprising an inner wall and an outer wall.

WO/2023/008877	METHOD FOR MANUFACTURING PELLICLE HAVING RECESS AND PROTRUSION STRUCTURE
JP4973875	Synthetic quartz glass substrate storage case for photomask
JPH064349	[Name of device] 1-sheet storage container for pattern board

NAKASHIMA JUNICHI (JP)
HOUJOU TOMOYA (JP)
FUKUI TAKASHI (JP)
TADOKORO ATSUHITO (JP)
HORIUCHI TOMOTAKA (JP)
MAEDA KENTO (JP)
FUKUI MIKIO (JP)

PCT/JP2021/030541

February 24, 2022

August 20, 2021

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SEKISUI SEIKEI CO LTD (JP)
NET PLASTIC CO LTD (JP)

G03F1/66; H01L21/673

JP2007091296A	2007-04-12
JP2008531416A	2008-08-14
JP2003140324A	2003-05-14
JP2008522414A	2008-06-26

IWATANI, Ryo (JP)

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