Title:
PHOTOMASK DEFECT DETECTION METHOD AND SYSTEM
Document Type and Number:
WIPO Patent Application WO/2022/017080
Kind Code:
A1
Abstract:
A photomask defect detection method and system. The photomask defect detection method comprises: providing a photomask (S110); providing a photomask defect detection system, and when the photomask is loaded or unloaded, continuously performing defect detection on the photomask, and acquiring defect information of each defect (S120); acquiring a dynamic threshold value of each defect from the defect information of each defect (S130); and determining whether the dynamic threshold value of each defect belongs to a threshold value which is unacceptable for the detection system, and if so, performing alarm processing (S140).
More Like This:
| WO/2022/209379 | DETERMINATION SYSTEM |
| JP4089798 | Surface inspection equipment |
| WO/2007/098525 | METHOD AND SYSTEM FOR THE MEASUREMENT OF CHEMICAL SPECIES IN CAUSTIC ALUMINATE SOLUTIONS |
Inventors:
HOU LIHUA (CN)
HSU WENHAO (CN)
HSU WENHAO (CN)
Application Number:
PCT/CN2021/100235
Publication Date:
January 27, 2022
Filing Date:
June 16, 2021
Export Citation:
Assignee:
CHANGXIN MEMORY TECH INC (CN)
International Classes:
G01N21/94; G03F1/84
Foreign References:
| CN108227371A | 2018-06-29 | |||
| TW201814244A | 2018-04-16 | |||
| CN110782045A | 2020-02-11 | |||
| CN102486604A | 2012-06-06 | |||
| CN103887203A | 2014-06-25 | |||
| CN105957061A | 2016-09-21 | |||
| US5445029A | 1995-08-29 |
Attorney, Agent or Firm:
ADVANCE CHINA IP LAW OFFICE (CN)
Download PDF: