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Patent Searching and Data


Title:
PHOTOMASK FOR MAKING LINER-TYPE BPS AND LIQUID CRYSTAL DISPLAY PANEL
Document Type and Number:
WIPO Patent Application WO/2020/062515
Kind Code:
A1
Abstract:
A photomask (50) for making a liner-type BPS and a liquid crystal display panel. The photomask (50) for making a liner-type BPS is provided with a liner pattern (52) for forming a main photo spacer color resist liner (51). The liner pattern (52) comprises a light-transmitting region and a shading pattern (53) having a key dimension and provided in the light-transmitting region. The shading pattern (53) having a key dimension is a regular pattern having sufficiently small linearity in a certain characteristic direction. The key dimension is less than or equal to 5 μm. The photomask (50) for making a liner-type BPS can increase the step conversion rate in subsequent application of a BPS material, and finally can up-regulate the actual step between the main photo spacer (131) and a sub photo spacer (141). The liner-type BPS of the liquid crystal display panel has a large step.

Inventors:
CAO WU (CN)
Application Number:
PCT/CN2018/116937
Publication Date:
April 02, 2020
Filing Date:
November 22, 2018
Export Citation:
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Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
International Classes:
G02F1/13; G03F1/26; G02F1/1333; G02F1/1339
Foreign References:
CN103852969A2014-06-11
CN107741673A2018-02-27
CN107402496A2017-11-28
CN107817648A2018-03-20
CN108535909A2018-09-14
US20100315573A12010-12-16
Attorney, Agent or Firm:
COMIPS INTELLECTUAL PROPERTY OFFICE (CN)
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