Title:
PHOTOMASK PROTECTION DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/253778
Kind Code:
A1
Abstract:
A photomask protection device, comprising: a pair of reflectors (12), the reflectors (12) being arranged in parallel to each other; and a laser tube (13) provided on one end of one of the reflectors (12) and used for emitting a laser beam to the other opposite reflector (12) at a certain inclination angle, wherein the laser beam is reflected back and forth between the two reflectors (12) to form a laser blocking net (15) on a photomask, and pollution particles are moved after being impacted by the laser beam and are removed from a key area of a photomask. The photomask protection device can effectively prevent the photomask from being polluted by the particles, reduces the pollution of an organic matter, avoids the defect printing, and can improve the yield and the photoetching working efficiency.
Inventors:
GU ZHENG (CN)
WU QIANG (CN)
LI YANLI (CN)
WU QIANG (CN)
LI YANLI (CN)
Application Number:
PCT/CN2020/138325
Publication Date:
December 23, 2021
Filing Date:
December 22, 2020
Export Citation:
Assignee:
SHANGHAI IC R & D CENTER CO LTD (CN)
SHANGHAI INTEGRATED CIRCUIT EQUIPMENT & MAT INDUSTRY INNOVATION CENTER CO (CN)
SHANGHAI INTEGRATED CIRCUIT EQUIPMENT & MAT INDUSTRY INNOVATION CENTER CO (CN)
International Classes:
G03F1/82
Foreign References:
| CN111736425A | 2020-10-02 | |||
| CN102989720A | 2013-03-27 | |||
| CN104181781A | 2014-12-03 | |||
| CN110976428A | 2020-04-10 | |||
| US20050121144A1 | 2005-06-09 | |||
| US6566169B1 | 2003-05-20 | |||
| US20120247504A1 | 2012-10-04 |
Attorney, Agent or Firm:
SHANGHAI TIANCHEN INTELLECTUAL PROPERTY AGENCY (CN)
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