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Patent Searching and Data


Title:
PHOTOMASK FOR USE IN MANUFACTURING ACTIVE SWITCH AND MANUFACTURING METHOD OF DISPLAY PANEL
Document Type and Number:
WIPO Patent Application WO/2020/103187
Kind Code:
A1
Abstract:
Disclosed are a photomask for use in manufacturing an active switch and a manufacturing method of a display panel. The photomask comprises a light-blocking region, a translucent region, a transparent region and an exposed region. The light-blocking region corresponds to a metal layer of an active switch, and is configured to be non-optically transmissive. The translucent region corresponds to a channel region of the active switch, and is configured to be partially optically transmissive. The transparent region is the remaining region of the photomask other than the light-blocking region and the translucent region, and is configured to be fully optically transmissivent. The exposed region is positioned within the translucent region, and is configured to be fully optically transmissive.

Inventors:
WU CHUAN (CN)
Application Number:
PCT/CN2018/119061
Publication Date:
May 28, 2020
Filing Date:
December 04, 2018
Export Citation:
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Assignee:
HKC CORP LTD (CN)
International Classes:
G03F1/00; G03F1/54
Foreign References:
CN101231458A2008-07-30
CN101231458A2008-07-30
CN107132724A2017-09-05
CN101598894A2009-12-09
CN203658725U2014-06-18
CN101943854A2011-01-12
KR20080032290A2008-04-15
Attorney, Agent or Firm:
SHENZHEN BAIRUI PATENT&TRADEMARK OFFICE (CN)
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