PHOTOPOLYMERIZABLE LAYERED PRODUCT WITH HIGH RESOLUTION AND SEMICONDUCTOR DEVICE MADE WITH THE SAME

WIPO Patent Application WO/2000/058788

A1

A photopolymerizable layered product useful as a dry film resist (DFR); and a semiconductor device and a liquid-crystal apparatus both obtained with the layered product. The layered product comprises a photopolymerizable layer and a support layer, wherein the photopolymerizable layer comprises (A) 100 parts by weight of a resin which is a carboxylated copolymer obtained by reacting a diol compound with an acid dianhydride and has a weight-average molecular weight of 3,000 to 40,000 and an acid value of 50 to 200 mgKOH/g, (B) 25 to 180 parts by weight of an unsaturated compound having two or more photopolymerizable terminal ethylenic groups per molecule, and (C) a photopolymerization initiator. The photopolymerizable layered product not only is improved in unsusceptibility to cold flow, film flexibility and strength, substrate-conforming properties during laminating, and developability but is excellent in resolution and adhesion. Hence, a high-performance semiconductor device, display, etc. can be provided.

FUJISHIRO KOICHI (JP)
INABA SHINJI (JP)
OKITA SHINSUKE (JP)

PCT/JP2000/001814

October 05, 2000

March 24, 2000

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NIPPON STEEL CHEMICAL CO (JP)
FUJISHIRO KOICHI (JP)
INABA SHINJI (JP)
OKITA SHINSUKE (JP)

G03F7/00; G03F7/004; G03F7/027; G03F7/032; H01L21/027; (IPC1-7): G03F7/027; G03F7/004; H01L21/027

JPH11231523A	1999-08-27
JPH09325494A	1997-12-16
JPH08278630A	1996-10-22
JPH05339356A	1993-12-21
JPH0570528A	1993-03-23
JPH10161306A	1998-06-19
JPH08123016A	1996-05-17
JPH07199457A	1995-08-04

Naruse, Katsuo (Nishi-shinbashi 2-chome Minato-ku Tokyo, JP)

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