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Title:
PHOTORESIST CLEANING SOLUTION, AS WELL AS PREPARATION METHOD THEREFOR AND CLEANING METHOD THEREOF
Document Type and Number:
WIPO Patent Application WO/2024/000740
Kind Code:
A1
Abstract:
A photoresist cleaning solution, as well as a preparation method therefor and a cleaning method thereof in the technical field of photoresist cleaning. The photoresist cleaning solution comprises: a cleaning agent, a metal corrosion inhibitor and water; the cleaning agent comprises a first cleaning agent and/or a second cleaning agent, the first cleaning agent comprising a pyrrolidinone compound; the second cleaning agent comprises alkyl ammonium hydroxide; the metal corrosion inhibitor comprises benzotriazole and a derivative thereof. The photoresist cleaning solution can completely remove a photoresist without corroding a metal film, especially a chromium film, and may achieve repeated photoresist coating and utilization of a chromium-plated substrate, thus having remarkable economic benefits.

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Inventors:
DU XIUTONG (CN)
ZHANG KAI (CN)
Application Number:
PCT/CN2022/111340
Publication Date:
January 04, 2024
Filing Date:
August 10, 2022
Export Citation:
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Assignee:
BEIJING U PREC TECH CO LTD (CN)
BEIJING UNITED VICTORY PRECISION TECH CO LTD (CN)
International Classes:
G03F7/42
Foreign References:
CN102411269A2012-04-11
CN1849386A2006-10-18
CN111356759A2020-06-30
US5849467A1998-12-15
US20080139436A12008-06-12
US20090120457A12009-05-14
Attorney, Agent or Firm:
BEIJING HUIYINGJIECHUANG INTELLECTUAL PROPERTY AGENCY (CN)
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