PHOTORESIST COMPOSITION AND CURED PRODUCT OF SAME

Title:

PHOTORESIST COMPOSITION AND CURED PRODUCT OF SAME

Document Type and Number:

WIPO Patent Application WO/2020/203790

Kind Code:

A1

Abstract:

[Problem] To provide a photoresist composition which enables development with use of a weak alkaline developer liquid and achievement of fine patterning with high resolution, while having excellent releasability. [Solution] A photoresist composition which contains (A) a carboxyl group-containing resin, (B) a photopolymerizable monomer and (C) a thermosetting component, and which is characterized in that if the photoresist composition is applied onto a flat substrate so that the film thickness of the photoresist composition after curing is 2 μm ± 0.5 μm, and is subsequently cured, after 30-minute prebaking at 75°C, by being exposed to ultraviolet light 1 including the wavelength of 375 nm in the ambient atmosphere with the amount of exposure light of 1,000 mJ/cm2, and Ra1 is the arithmetic mean roughness Ra of the surface of a cured coating film 1 that is formed by subsequent 180-second development at 30°C with use of a 1 wt% aqueous Na2CO3 solution, while Ra2 is the arithmetic mean roughness Ra of the surface of a cured coating film 2 that is formed by exposing the cured coating film 1 to ultraviolet light 2 including the wavelength of 185 nm and the wavelength of 254 nm in an oxygen atmosphere with the amount of exposure light of 25.2 mJ/cm2, Ra1 and Ra2 satisfy the formula Ra2/Ra1 ≤ 4.5 × 10-1.

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Inventors:

SHIBATA DAISUKE (JP)
ARAI YASUAKI (JP)
SATO KAZUYA (JP)
WEI XIAOZHU (JP)

Application Number:

PCT/JP2020/014076

Publication Date:

October 08, 2020

Filing Date:

March 27, 2020

Export Citation:

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Assignee:

TAIYO INK MFG CO LTD (JP)

International Classes:

G03F7/027; G03F7/037; G03F7/20; G03F7/26; G03F7/40

Foreign References:

JP2006011039A	2006-01-12
JP2012208453A	2012-10-25
JP2010152154A	2010-07-08
JP2009003000A	2009-01-08
JPH1073923A	1998-03-17

Attorney, Agent or Firm:

NAKAMURA Yukitaka et al. (JP)

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