Title:
PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS
Document Type and Number:
WIPO Patent Application WO2003107093
Kind Code:
A3
Abstract:
The present invention relates to a novel photoresist composition that can be developed with an aqueous alkaline solution, and is capable of being imaged at exposure wavelengths in the deep ultraviolet. The invention also relates to a process for imaging the novel photoresist as well as novel photoacid generators.
Inventors:
PADMANABAN MUNIRATHNA
KUDO TAKANORI
LEE SANGHO
DAMMEL RALPH R
RAHMAN DALIL M
KUDO TAKANORI
LEE SANGHO
DAMMEL RALPH R
RAHMAN DALIL M
Application Number:
PCT/EP2003/006139
Publication Date:
April 01, 2004
Filing Date:
June 11, 2003
Export Citation:
Assignee:
CLARIANT INT LTD (CH)
International Classes:
G02F1/13; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): G03F7/004; G03F7/039
Foreign References:
| EP1033624A1 | 2000-09-06 | |||
| EP1045290A2 | 2000-10-18 | |||
| US5021197A | 1991-06-04 | |||
| EP0877293A2 | 1998-11-11 | |||
| US5648196A | 1997-07-15 | |||
| EP0502382A1 | 1992-09-09 | |||
| JPH1048814A | 1998-02-20 | |||
| JPH0827094A | 1996-01-30 | |||
| EP1085377A1 | 2001-03-21 |
Other References:
G.A. OLAH, E.G. MELBY: "Onium Ions: Alkylarylhalonium Ions", JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, vol. 94, no. 17, 23 August 1972 (1972-08-23), USA, pages 6220 - 6221, XP002265156
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