Title:
PHOTORESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2013/047528
Kind Code:
A1
Abstract:
The present invention involves a photoresist composition containing (A) a polymer having a structural unit (I) represented by formula (1), and (B) an acid-generating body, wherein the Van der Waals volume of the acid generated from the acid-generating body (B) is not less than 2.1 × 10-28m3. In formula (1): R1 is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group. R2 and R3 are, independently, each a hydrogen atom, a fluorine atom, a hydroxy group or a monovalent organic group with one to twenty carbons, or R2 and R3 are combined with each other to represent a ring structure with three to twenty carbons constituted in conjunction with a carbon atom to which R2 and R3 are bonded; and R4 and R5 are, independently, each a hydrogen atom or a monovalent organic group with one to twenty carbons, or R4 and R5 are combined with each other to represent a ring structure with three to twenty carbons constituted in conjunction with a carbon atom to which R4 and R5 are bonded. n is an integer from one to four.
Inventors:
KASAHARA KAZUKI (JP)
IKEDA NORIHIKO (JP)
IKEDA NORIHIKO (JP)
Application Number:
PCT/JP2012/074576
Publication Date:
April 04, 2013
Filing Date:
September 25, 2012
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/004; G03F7/039
Domestic Patent References:
| WO2011093280A1 | 2011-08-04 | |||
| WO2012043685A1 | 2012-04-05 |
Foreign References:
| JP2003122012A | 2003-04-25 | |||
| JP2003195504A | 2003-07-09 | |||
| JP2003107709A | 2003-04-09 | |||
| JP2006317794A | 2006-11-24 | |||
| JP2004085900A | 2004-03-18 | |||
| JP2002308937A | 2002-10-23 | |||
| JP2001081139A | 2001-03-27 | |||
| JP2002006502A | 2002-01-09 | |||
| JP2007052346A | 2007-03-01 | |||
| JP5035466B1 | 2012-09-26 |
Attorney, Agent or Firm:
AMANO KAZUNORI (JP)
Kazuki Amano (JP)
Kazuki Amano (JP)
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Claims: