Title:
PHOTORESIST-FREE OPTICAL PATTERNING METHOD FOR COLLOIDAL NANOCRYSTALS IN GREEN SOLVENT
Document Type and Number:
WIPO Patent Application WO/2024/045525
Kind Code:
A1
Abstract:
The present invention relates to the technical field of nanomaterials and optical etching, and provides a photoresist-free optical patterning method for colloidal nanocrystals in a green solvent. A photosensitive ligand structurally similar to the green solvent is introduced to successfully disperse nanocrystals in the green solvent and perform photolithography directly on the nanocrystals. Photosensitive nanocrystals obtained through ligand exchange can be effectively dispersed in the green solvent to absorb an emission spectrum emitted by the green solvent, thereby preserving about 90% of photoluminescence quantum yield (PLQY) while keeping the morphology and size unchanged. The scheme solves the problem that nanocrystals cannot be subject to direct photolithography in the green solvent, and is expected to be applied to the commercialization of nanocrystals in the field of electroluminescent and photoluminescent quantum dot displays.
Inventors:
WANG YUANYUAN (CN)
XIAO PENGWEI (CN)
ZHANG ZHOUFAN (CN)
LUO HUANHUAN (CN)
XIAO PENGWEI (CN)
ZHANG ZHOUFAN (CN)
LUO HUANHUAN (CN)
Application Number:
PCT/CN2023/078990
Publication Date:
March 07, 2024
Filing Date:
March 01, 2023
Export Citation:
Assignee:
NANJING UNIVERSITY OF TECHNOLOGY (CN)
International Classes:
G03F7/027; G03F7/004
Foreign References:
| CN115308997A | 2022-11-08 | |||
| CN114958072A | 2022-08-30 | |||
| CN111117603A | 2020-05-08 | |||
| CN114350184A | 2022-04-15 | |||
| US20170059986A1 | 2017-03-02 | |||
| US20170115561A1 | 2017-04-27 | |||
| US20180105739A1 | 2018-04-19 | |||
| US20210317365A1 | 2021-10-14 | |||
| CN109749733A | 2019-05-14 |
Attorney, Agent or Firm:
NANJING ZHONGLIAN PATENT AGENCY CO., LTD. (CN)
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