Title:
PHOTORESIST MATERIAL AND PREPARATION METHOD THEREFOR, AND COLOUR FILM SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2021/128503
Kind Code:
A1
Abstract:
A photoresist material and a preparation method therefor, and a colour film substrate, the photoresist material comprising oligomer segments, the chemical structural formula thereof being (I), and the value of n being 1-2.
Inventors:
AI LIN (CN)
Application Number:
PCT/CN2020/071478
Publication Date:
July 01, 2021
Filing Date:
January 10, 2020
Export Citation:
Assignee:
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD (CN)
International Classes:
G03F7/00; C07F3/06; G02B5/22; G02B1/04
Domestic Patent References:
| WO2014157387A1 | 2014-10-02 |
Foreign References:
| JP2011118275A | 2011-06-16 | |||
| JP2010085647A | 2010-04-15 | |||
| CN108700809A | 2018-10-23 | |||
| CN101078876A | 2007-11-28 |
Other References:
YANIK HÜLYA; GÖKSEL MELTEM; YEŞILOT SERKAN; DURMUŞ MAHMUT: "Novel phthalocyanine–BODIPY conjugates and their photophysical and photochemical properties", TETRAHEDRON LETTERS, ELSEVIER, AMSTERDAM , NL, vol. 57, no. 26, 21 May 2016 (2016-05-21), Amsterdam , NL, pages 2922 - 2926, XP029570904, ISSN: 0040-4039, DOI: 10.1016/j.tetlet.2016.05.080
Attorney, Agent or Firm:
PURPLEVINE INTELLECTUAL PROPERTY (SHENZHEN) CO., LTD. (CN)
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