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Title:
PHOTOSENSITIVE COMPOSITION, LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD
Document Type and Number:
WIPO Patent Application WO/2020/137919
Kind Code:
A1
Abstract:
The present invention provides: a photosensitive composition containing a polymer having a group represented by a specific formula (1); a lithographic printing plate precursor having an image recording layer containing the photosensitive composition on a support; a method for producing a lithographic printing plate; and a lithographic printing method.

Inventors:
ISHIJI YOHEI (JP)
SAKAGUCHI AKIRA (JP)
Application Number:
PCT/JP2019/050198
Publication Date:
July 02, 2020
Filing Date:
December 20, 2019
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
B41N1/14; C08F265/00; C08F290/06; C08G73/02; G03F7/00; G03F7/033; G03F7/038
Domestic Patent References:
WO2018221134A12018-12-06
Foreign References:
JP2018087910A2018-06-07
JP2005014230A2005-01-20
JP2006256132A2006-09-28
JP2002062648A2002-02-28
JP2007249037A2007-09-27
JP2009006652A2009-01-15
JP2012189847A2012-10-04
JP2002166672A2002-06-11
JP2002154280A2002-05-28
JP2005231347A2005-09-02
Attorney, Agent or Firm:
KOH-EI PATENT FIRM, P.C. (JP)
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