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Title:
PHOTOSENSITIVE COMPOSITION, PATTERN FILM-PROVIDED SUBSTRATE, AND SUBSTRATE LAMINATE AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2023/100736
Kind Code:
A1
Abstract:
A substrate laminate (10) has a first substrate (11), a second substrate (12), and a cured object layer (13) that adheres the first substrate (11) and the second substrate (12) together. The cured object layer (13) is formed of a cured object of a photosensitive composition. The photosensitive composition contains: a cation-polymerizable compound having a cation-polymerizable group and a specific alkali-soluble group per molecule; a radical-polymerizable compound having a (meth)acryloyl group; and a photoinitiator. The photoinitiator is a photoradical polymerization initiator. The amount of the radical-polymerizable compound is 5 parts by mass or more with respect to 100 parts by mass of the cation-polymerizable compound.

Inventors:
OGAWA AYUMU (JP)
SAITO YUTA (JP)
KURODA KENTA (JP)
Application Number:
PCT/JP2022/043327
Publication Date:
June 08, 2023
Filing Date:
November 24, 2022
Export Citation:
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Assignee:
KANEKA CORP (JP)
International Classes:
C08G59/20; G03F7/038; C09D4/02; C09D7/63; C09D183/04; G03F7/004; G03F7/027; G03F7/031; G03F7/075
Foreign References:
JP2017082173A2017-05-18
JP2015069164A2015-04-13
JP2018060136A2018-04-12
JP2010223992A2010-10-07
JP2011221192A2011-11-04
JP2017090513A2017-05-25
JP2010106120A2010-05-13
Attorney, Agent or Firm:
HARUKA PATENT & TRADEMARK ATTORNEYS (JP)
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