Title:
PHOTOSENSITIVE ELEMENT, SEMICONDUCTOR DEVICE, AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2018/164233
Kind Code:
A1
Abstract:
Disclosed is a photosensitive element having a photosensitive layer and a protective layer, wherein the photosensitive layer contains: component (A), a resin having a phenolic hydroxyl group; component (B), a photosensitive acid generator; component (C), a compound having at least one selected from the group consisting of an aromatic ring, a heterocyclic ring, and an alicyclic ring, and having at least one among a methylol group and an alkoxyalkyl group; and component (D), an aliphatic compound having two or more of at least one functional group selected from the group consisting of an acryloyloxy group, a methacryloyloxy group, a glycidyloxy group, an oxetanylalkyl ether group, a vinyl ether group, and a hydroxyl group, and the contents of component (C) and component (D) in the photosensitive layer are within specific ranges.
Inventors:
KATO TETSUYA (JP)
IWASHITA KENICHI (JP)
SUZUKI YOSHIKAZU (JP)
IWASHITA KENICHI (JP)
SUZUKI YOSHIKAZU (JP)
Application Number:
PCT/JP2018/009068
Publication Date:
September 13, 2018
Filing Date:
March 08, 2018
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD (JP)
International Classes:
G03F7/038; B32B27/04; G03F7/004; G03F7/075; G03F7/20; H05K1/03; H05K3/28; H05K3/46
Foreign References:
| JP2016188924A | 2016-11-04 | |||
| JP2016188985A | 2016-11-04 | |||
| JP2016188987A | 2016-11-04 | |||
| JP2016188922A | 2016-11-04 |
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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