Title:
PHOTOSENSITIVE POLYESTER COMPOSITION FOR USE IN FORMING THERMALLY CURED FILM
Document Type and Number:
WIPO Patent Application WO/2010/119868
Kind Code:
A1
Abstract:
Disclosed is a material which enables pattern formation in an alkaline developer, and shows high solvent resistance, liquid crystal orientation, heat resistance, high transparency, and high planarity after being formed into a cured film, and can be dissolved in a glycol solvent which can be applied to the production line of a planarized film of a color filter while being formed into a cured film. Specifically disclosed is a photosensitive polyester composition for use in forming thermally cured film, containing component (A), component (B), component (C), and component (D): component (A): a modified polyester obtained by reacting a compound having a functional group selected from a glycidyl group and an isocyanate group with a polyester containing a structural unit represented by formula (1); component (B): an epoxy compound having two or more epoxy groups; component (C): an amino group-containing carboxylic acid compound obtained by reacting a diamine compound with dicarboxylic acid dianhydride; and component (D): 1,2-quinone diazide compound. In formula (1), A and B each independently represent an organic group containing a cyclic structure.
Inventors:
HATANAKA TADASHI (JP)
ADACHI ISAO (JP)
ADACHI ISAO (JP)
Application Number:
PCT/JP2010/056601
Publication Date:
October 21, 2010
Filing Date:
April 13, 2010
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
HATANAKA TADASHI (JP)
ADACHI ISAO (JP)
HATANAKA TADASHI (JP)
ADACHI ISAO (JP)
International Classes:
C08G59/56; C08G63/91; C08K5/20; C08K5/3415; C08L63/00; C08L67/02
Domestic Patent References:
| WO2003072634A1 | 2003-09-04 | |||
| WO2008153101A1 | 2008-12-18 |
Foreign References:
| JPS5388097A | 1978-08-03 | |||
| JPS5041998A | 1975-04-16 | |||
| JPH0665335A | 1994-03-08 | |||
| JPS531284A | 1978-01-09 | |||
| JP2005037920A | 2005-02-10 | |||
| JPH10120786A | 1998-05-12 | |||
| JPH07310048A | 1995-11-28 | |||
| JP2002116541A | 2002-04-19 | |||
| JPH10239842A | 1998-09-11 | |||
| JP2001147529A | 2001-05-29 | |||
| JPH10273525A | 1998-10-13 |
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (JP)
Sepal Tsuneo (JP)
Sepal Tsuneo (JP)
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