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Title:
PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT OF SAME, METHOD FOR PRODUCING SAME, METHOD FOR PRODUCING RESIN PATTERN, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, AND TOUCH PANEL DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2014/034768
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a photosensitive resin composition which has excellent resolution and is able to provide a cured product that has a small haze and a high refractive index. A photosensitive resin composition of the present invention is characterized by containing: (component A) a polymer that has a constituent unit having a group wherein an acid group is protected with an acid-decomposable group; (component B) a heterocyclic compound having two or more nitrogen atoms; (component C) a photoacid generator; (component D) metal oxide particles; and (component E) a solvent. It is preferable that the component B is a compound having a heterocyclic structure which has at least a nitrogen atom at the 1-position and at the 3-position.

Inventors:
NAKAMURA HIDEYUKI (JP)
SUZUKI SHIGEKAZU (JP)
Application Number:
PCT/JP2013/073116
Publication Date:
March 06, 2014
Filing Date:
August 29, 2013
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/004; C08L101/02; G03F7/039; H01L51/50; H05B33/12; H05B33/22
Domestic Patent References:
WO2005088396A12005-09-22
Foreign References:
JP2006510046A2006-03-23
JP2005292613A2005-10-20
JP2013080192A2013-05-02
JP2013083844A2013-05-09
Attorney, Agent or Firm:
NOGUCHI YASUHIRO (JP)
Takahiro Noguchi (JP)
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