Title:
PHOTOSENSITIVE RESIN COMPOSITION FOR FORMATION OF MICROLENSES
Document Type and Number:
WIPO Patent Application WO/2012/105288
Kind Code:
A1
Abstract:
[Problem] To provide a photosensitive resin composition for the formation of microlenses. [Solution] A photosensitive resin composition for the formation of microlenses, comprising: (A) a copolymer which comprises maleimide structural units represented by formula (1), vinyl ether structural units represented by formula (2), and at least one kind of structural units represented by formula (3), (4) or (5); (B) a photosensitizer; and (C) a crosslinking agent. In the formulae, X is a C1-20 hydrocarbon group which may have either an ether bond or a cyclic structure; Y is an optionally substituted organic group; and Z is an optionally substituted aromatic hydrocarbon group or an alkoxy group.
Inventors:
SAKAGUCHI TAKAHIRO (JP)
Application Number:
PCT/JP2012/050479
Publication Date:
August 09, 2012
Filing Date:
January 12, 2012
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
SAKAGUCHI TAKAHIRO (JP)
SAKAGUCHI TAKAHIRO (JP)
International Classes:
G02B1/04; C08F212/02; C08F216/14; C08F222/40; C08F232/08; G02B3/00; G03F7/033
Domestic Patent References:
| WO2008143095A1 | 2008-11-27 | |||
| WO2009084382A1 | 2009-07-09 | |||
| WO2010007915A1 | 2010-01-21 | |||
| WO2011024545A1 | 2011-03-03 |
Foreign References:
| JP2009157038A | 2009-07-16 | |||
| JP2009179770A | 2009-08-13 |
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (JP)
Sepal Tsuneo (JP)
Sepal Tsuneo (JP)
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Claims: