Title:
PHOTOSENSITIVE RESIN COMPOSITION, LITHOGRAPHIC PRINTING ORIGINAL PLATE AND PLATE MAKING METHOD FOR LITHOGRAPHIC PRINTING PLATE
Document Type and Number:
WIPO Patent Application WO/2017/038423
Kind Code:
A1
Abstract:
This photosensitive resin composition contains, as a component A, a polymer compound having a structure represented by formula 1, while containing, as a component B, an infrared absorbent. This lithographic printing original plate has, on a supporting body, a recording layer that contains, as a component A, a polymer compound having a structure represented by formula 1, while containing, as a component B, an infrared absorbent. In formula 1, R1 represents an (x + 2)-valent aromatic hydrocarbon ring group; and x represents an integer of 1-4.
Inventors:
NOZAKI ATSUYASU (JP)
YASUHARA YUICHI (JP)
YASUHARA YUICHI (JP)
Application Number:
PCT/JP2016/073654
Publication Date:
March 09, 2017
Filing Date:
August 10, 2016
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/039; C08G69/32; G03F7/00; G03F7/004; G03F7/095; G03F7/11; G03F7/32
Domestic Patent References:
| WO2011067998A1 | 2011-06-09 |
Foreign References:
| JP2005091429A | 2005-04-07 | |||
| JP2004145320A | 2004-05-20 | |||
| JP2005266001A | 2005-09-29 | |||
| JP2000143806A | 2000-05-26 | |||
| JP2004157461A | 2004-06-03 |
Other References:
See also references of EP 3346331A4
Attorney, Agent or Firm:
NAKAJIMA, Jun et al. (JP)
Download PDF: