Title:
PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2022/202098
Kind Code:
A1
Abstract:
This photosensitive resin composition comprises: a reaction product of an aromatic diamine compound having a photopolymerizable group and a tetracarboxylic acid derivative having three or more aromatic rings; and a solvent.
Inventors:
ENDO TAKAFUMI (JP)
ISHII HIDENORI (JP)
SAKAGUCHI TAKAHIRO (JP)
OGINO HIROSHI (JP)
HOSHINO YUKI (JP)
ISHII HIDENORI (JP)
SAKAGUCHI TAKAHIRO (JP)
OGINO HIROSHI (JP)
HOSHINO YUKI (JP)
Application Number:
PCT/JP2022/007899
Publication Date:
September 29, 2022
Filing Date:
February 25, 2022
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
C08G73/10; G03F7/004; G03F7/027; G03F7/20; G03F7/32
Domestic Patent References:
| WO1999051662A1 | 1999-10-14 | |||
| WO2021107024A1 | 2021-06-03 |
Foreign References:
| JPH01113748A | 1989-05-02 | |||
| JPH01118514A | 1989-05-11 |
Attorney, Agent or Firm:
TAKAOKA Ryoichi et al. (JP)
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