PHOTOSENSITIVE STRUCTURE FOR FLEXOGRAPHIC PRINTING AND PROCESS FOR PRODUCING THE SAME

Title:

PHOTOSENSITIVE STRUCTURE FOR FLEXOGRAPHIC PRINTING AND PROCESS FOR PRODUCING THE SAME

Document Type and Number:

WIPO Patent Application WO/2005/085953

Kind Code:

A1

Abstract:

A photosensitive structure for flexographic printing, comprising a laminate of support (A), foundation layer (B) and photosensitive resin layer (C), wherein the foundation layer (B) has closed cells (a) provided with dividing walls, the closed cell (a) component ranging from 20 to 90 wt.% based on the total weight of foundation layer (B).

Inventors:

MATSUMOTO MASAKI (JP)
YOKOTA MASAHISA (JP)

Application Number:

PCT/JP2004/005999

Publication Date:

September 15, 2005

Filing Date:

April 26, 2004

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Assignee:

ASAHI KASEI CHEMICALS CORP (JP)
MATSUMOTO MASAKI (JP)
YOKOTA MASAHISA (JP)

International Classes:

B41N1/12; G03F7/00; G03F7/11; (IPC1-7): G03F7/00; B41N1/12; G03F7/11

Foreign References:

JP2003519036A	2003-06-17
JP2001264959A	2001-09-28
JPS59212298A	1984-12-01
JPS6184289A	1986-04-28

Attorney, Agent or Firm:

Asamura, Kiyoshi (New Ohtemachi Bldg. 2-1, Ohtemachi 2-chom, Chiyoda-ku Tokyo 04, JP)

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