PIPING APPARATUS HAVING TOXIC GAS TREATMENT DEVICE, DESIGN METHOD THEREFOR, AND TOXIC GAS TREATMENT FACILITY COMPRISING SAME

WIPO Patent Application WO/2020/013426

A1

According to the present invention, provided is a piping apparatus through which exhaust gas discharged from a process chamber by a vacuum pump flows, the piping apparatus comprising: an exhaust pipe providing a passage through which the exhaust gas discharged by the vacuum pump flows; and a toxic gas treatment device positioned between the rear end of the vacuum pump and the front end of the exhaust pipe or positioned on the exhaust pipe so as to treat toxic gas contained in the exhaust gas, wherein the toxic gas treatment device comprises a heating means for increasing the temperature of the exhaust gas in order to prevent a sublimable component, from among components included in the exhaust gas, from being sublimated and accumulated inside the exhaust pipe, the heating means is positioned on a section including a sublimation condition occurrence point, at which a sublimation condition of the sublimable component occurs, and an upstream side of the sublimation condition occurrence point on the exhaust pipe, and the sublimation condition is a temperature condition for the pressure of the sublimable component.

BAE JIN HO (KR)
LEE YU JIN (KR)
KIM HYUNG JUN (KR)
RA JEONG KYUN (KR)
KIM HO SIK (KR)
JU WON HONG (KR)

PCT/KR2019/004620

January 16, 2020

April 17, 2019

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CLEAN FACTORS CO LTD (KR)
LOT VACUUM CO LTD (KR)

H01L21/67; B01D47/00; B01D53/00; B01D53/32; B01D53/78; B01D53/86

KR20160109777A	2016-09-21
KR100656538B1	2006-12-11
KR101291982B1	2013-08-09
KR20180066572A	2018-06-19
JPH1054356A	1998-02-24

JEON, Yong Joon (KR)

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