Title:
PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2021/256327
Kind Code:
A1
Abstract:
A substrate surface planarization method includes an arranging step of arranging a liquid curable composition onto a substrate surface having unevenness, a waiting step of waiting until the surface of the layer of the liquid curable composition becomes smooth, and a light exposure step of applying light to cure the layer of the liquid curable composition in this order. The arranging step includes a first arranging step of arranging a layer made of a first liquid curable composition (A1) containing at least a polymerizable compound (a1), and a second arranging step of arranging droplets of a second liquid curable composition (A2) containing at least a polymerizable compound (a2) onto the layer made of the first liquid curable composition (A1) by dropping the droplets discretely.
Inventors:
ITO TOSHIKI (JP)
KIYOHARA NAOKI (JP)
CHIBA KEIKO (JP)
STACHOWIAK TIMOTHY BRIAN (JP)
YAMASHITA KEIJI (JP)
KIYOHARA NAOKI (JP)
CHIBA KEIKO (JP)
STACHOWIAK TIMOTHY BRIAN (JP)
YAMASHITA KEIJI (JP)
Application Number:
PCT/JP2021/021718
Publication Date:
December 23, 2021
Filing Date:
June 08, 2021
Export Citation:
Assignee:
CANON KK (JP)
International Classes:
H01L21/027
Foreign References:
| US20200166836A1 | 2020-05-28 | |||
| US20100012622A1 | 2010-01-21 | |||
| US20200171716A1 | 2020-06-04 | |||
| JP2019062057A | 2019-04-18 |
Attorney, Agent or Firm:
OKABE Yuzuru et al. (JP)
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