Title:
PLASMA CLEANING DEVICE AND USE METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2021/203367
Kind Code:
A1
Abstract:
A plasma cleaning device and a use method therefor. The plasma cleaning device (10) comprises an operation platform (100), a material box (200), a plasma generator (300), a material moving module (400), and a lifting module (500). The operation platform (100) has a preparation position (110) and a feeding position (120). The material box (200) is used for accommodating a product (20), and the feeding position (120) is located below the product in the material box (200). The lifting module (500) is used for driving the material box (200) to move along a vertical direction. The plasma generator (300) is disposed on the operation platform (100) and is adjacent to the material box (200), and the preparation position (110) is located on the side of the plasma generator (300) away from the material box (200). The material moving module (400) comprises a material moving driving mechanism (410) and a feeding mechanism (420) for carrying the product (20). The material moving driving mechanism (410) drives the feeding mechanism (420) to perform reciprocating movement between the preparation position (110) and the feeding position (120), so that the product (20) in the feeding mechanism (420) passes through the plasma generator (300). When the feeding mechanism (420) is located at the feeding position (120), the lifting module (500) drives the material box (200) to move along the vertical direction, so that the product (20) falls from the material box (200) into the feeding mechanism (420), or the product (20) falls from the feeding mechanism (420) into the material box (200).
Inventors:
LI ZHI (CN)
REN NING (CN)
TAO QUAN (CN)
ZHU JUNRU (CN)
SHI JUNHUI (CN)
XIAO YAJUN (CN)
GAO YUNFENG (CN)
REN NING (CN)
TAO QUAN (CN)
ZHU JUNRU (CN)
SHI JUNHUI (CN)
XIAO YAJUN (CN)
GAO YUNFENG (CN)
Application Number:
PCT/CN2020/083995
Publication Date:
October 14, 2021
Filing Date:
April 09, 2020
Export Citation:
Assignee:
HANS LASER TECHNOLOGY IND GROUP CO LTD (CN)
International Classes:
B08B7/00; H01L21/02; H01L21/67
Domestic Patent References:
| WO2007067395A2 | 2007-06-14 |
Foreign References:
| CN107123587A | 2017-09-01 | |||
| CN208407930U | 2019-01-22 | |||
| CN206340521U | 2017-07-18 | |||
| CN208772051U | 2019-04-23 | |||
| CN205484099U | 2016-08-17 | |||
| CN110060944A | 2019-07-26 | |||
| US4568234A | 1986-02-04 |
Attorney, Agent or Firm:
ADVANCE CHINA IP LAW OFFICE (CN)
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