In a first aspect, the invention relates to a coated substrate, wherein the coating is obtained or obtainable from depositing on a surface of a substrate by a plasma-assisted deposition method a reaction product of a fluorine-free compound selected from the group consisting of a lactam with 4 to 8 ring atoms, a lactone with 4 to 8 ring atoms, vinylacetate, polyvinylpyrrolidone, C5 to C8 alkyne and mixtures of two or more of these compounds.

A second aspect of the invention is related to a plasma-assisted deposition method for applying a coating based on a reaction product of a fluorine-free compound onto a surface of a substrate.

A third aspect of the invention is related to the use of a coated substrate according to the first aspect or of a coated substrate obtained or obtainable from the plasma-assisted deposition method of the second aspect, for packaging, storing and/or transporting a good selected from the group consisting of food, beverage and chemical wherein the good is preferably a chemical, more preferably an agrochemical.

State-of-the-art vessels for packaging of plant protection products (PPP), so-called agrochemicals, are usually designed in a way that the walls of the vessels do not allow permeation of the agrochemicals, solvents and/or other formulation components during transport, storage and application. This requires commonly used packaging materials such as polyethylene (PE) to be equipped with a barrier technology. Major established industrial processes to achieve this rely on (i) compounding or coextruding PE with less permeable polymers like polyamide (PA) or ethylene-vinylalcohol (EVOH) copolymer, e.g. in the form of thick (multi-pm) surface or interphase layers, or (ii) coating the interior surfaces of the vessels with thin (typically <1 pm) layers of (per)fluorinated compounds. The latter (per)fluorinated coatings are classically obtained through gas-phase fluorination or, more recently, can also be achieved by plasma-assisted depositing of gaseous fluorochemicals (so-called “Plasma- enhanced chemical vapor deposition", PECVD). This plasma-based technology - published by Isytech (WO 2007/072120 A1) at low pressure - has proven to yield coatings with superior properties (high barrier effect, little mechanical deformation of containers during coating, easier recyclability) at comparatively low costs (in-line process).

However, both ways, i.e. compounding or coextruding with PA or EVOH as well as coating with a reaction product of (per)fluorinated compounds have severe disadvantages:

On the one hand, coatings based on (per)fluorinated compounds could fall under future restrictions of the use of perfluorinated alkyl substances (PFAS) in the US and EU27 and thus may need to be replaced by alternative technologies. On the other hand, existing fluorine-free technologies to achieve sufficient barrier properties often require laborious and cost-intensive processes such as coextrusion, wherein the PA or EVOH is coextruded with the substrate material, for example PE. Furthermore, the thickness of the PA or EVOH domains required for sufficient barrier against transmission of solvents and chemicals renders the container a multimaterial, which poses challenges in view of recycling and a circular economy. Consequently, for the recycling of both types of state-of-the-art barrier technologies, extensive preprocessing steps are required to separate the main container material (e.g. PE) from the barrier components (e.g. large amounts of PA or EVOH, or trace quantities of substances of very high concern (SVHC) such as perfluorinated alkyl species (PFAS)).

Thus, the problem underlying the present invention was the provision of a coating (and a corresponding coating process) for packaging materials employed as containers for chemicals, especially agrochemicals, that meets the following requirements: (i) fluorine-free components to address regulatory concerns; (ii) coating thickness much lower than for established PA or EVOH barrier technologies to facilitate recycling; (iii) barrier performance at least comparable to existing fluorine-containing coatings and PA or EVOH coextrusion multimaterials for functional competitiveness.

1st aspect - the coated substrate

The problem was solved by a coated substrate, wherein the coating is obtained or obtainable from depositing on a surface of a substrate by a plasma-assisted deposition method a reaction product of a fluorine-free compound selected from the group consisting of a lactam with 4 to 8 ring atoms, a lactone with 4 to 8 ring atoms, vinylacetate, polyvinylpyrrolidone, C5 to C8 alkyne and mixtures of two or more of these compounds.

It was surprisingly found that coatings based on the above-identified compounds allow a significant improvement of barrier properties, for example shown by a considerable reduction of the interaction of toluene vapor with the coated container walls, even if the coating is only a few tens of nanometers thick. Toluene is considered a representative solvent for testing barrier properties of a coating against transmission of hazardous compounds as present e.g. in agrochemical formulations. The interaction of toluene vapor with coated and uncoated HDPE substrates was probed by inverse gas chromatography and evaluated in the framework of the Brunauer-Emmett-Teller (BET) theory, which gives the monolayer capacity for toluene binding (q _BET , expressed as molar amounts of adsorbed toluene molecules per unit of explored surface area in pmol/cm ² ) as well as the corresponding dimensionless BET constant (CBET) as a measure for the strength of interaction. High barrier against toluene vapor isreflected by low values of q _BET and/or CBET. It was found that q _BE T of coatings obtained by plasma-assisted deposition of the fluorine-free compounds according to the invention is in the same range as q _B ET values of comparative coatings made from fluorine-containing compounds by plasma deposition or gas-phase fluorination as well as HDPE/PA coextrudates. Compared to an uncoated HDPE substrate, q _BE T is improved by the coating with fluorine-free compounds according to the invention by at least 20 %. C _BE T of the fluorine-free compounds according to the invention is in the same range as C _BE T values of a comparative coating made from a fluorine-containing compound as well as HDPE/PA coextrudates.

The coating with reaction products of fluorine-free components allows, due to the use of a plasma-based technique, a much easier application of the coating than established (HD)PE/PA coextrusion technologies; hence it is (much) cheaper to produce these coatings. Use of fluorine- free components avoids the formation and later potential release of (per)fluorinated substances. Due to the low amounts of applied coating material- as indicated above, the layer thicknesses required for sufficient barrier against toluene is only a few tens of nanometers- the coated substrates still qualify as monomaterial and can thus be recycled with much less effort.

In some preferred embodiments of the coated substrate, the compound used for depositing the coating on the surface of the substrate by a plasma-assisted deposition method is selected from the group consisting of a lactam with 4 to 8 ring atoms excluding vinylpyrrolidone, a lactone with 4 to 8 ring atoms, vinylacetate, polyvinylpyrrolidone, C5 to C8 alkyne and mixtures of two or more of these compounds.

In some preferred embodiments of the coated substrate, the compound used for depositing the coating on the surface of the substrate by a plasma-assisted deposition method is selected from the group consisting of a lactam with 4 to 8 ring atoms excluding vinylpyrrolidone, a lactone with 4 to 8 ring atoms, vinylacetate, 05 to C8 alkyne and mixtures of two or more of these compounds.

In some preferred embodiments of the coated substrate, the compound used for depositing the coating on the surface of the substrate by a plasma-assisted deposition method is selected from the group consisting of a lactam with 4 to 8 ring atoms excluding vinylpyrrolidone, a lactone with 4 to 8 ring atoms, vinylacetate and mixtures of two or more of these compounds, preferably selected from the group consisting of a lactone with 4 to 8 ring atoms, vinylacetate and mixtures of two or more of these compounds.

In some preferred embodiments of the coated substrate, the lactam with 4 to 8 ring atoms has formula (I) wherein

R ¹ is a vinyl group, x is zero or 1 , and n is an integer in the range of from 2 to 5, preferably in the range of from 2 to 4, more preferably n is 4 and x is zero (epsilon-caprolactam) and/ or n is 2 and x is 1 , wherein R ¹ is a vinyl group substituting the hydrogen atom at the nitrogen of the ring structure (vinylpyrrolidone).

R ¹ represents a vinyl group and the residue R ¹ , if present, is positioned at the nitrogen atom of the ring structure, where it replaces the hydrogen atom, or at a carbon atom of the ring structure, including any one of the C atoms of the group -[CH ₂ ] _n -. Vinylpyrrolidone, which is also a lactam, is N-vinyl-2-pyrrolidone, i.e. the nitrogen atom of the five membered lactam ring (gamma-lactam) bears a vinyl group as substituent instead of a hydrogen atom at this position. ln some preferred embodiments of the coated substrate, the lactone with 4 to 8 ring atoms, preferably 6 to 8 ring atoms, has formula (II)

R ² is selected from methyl group and vinyl group, y is zero or 1 , and m is an integer in the range of from 1 to 5, preferably in the range of from 3 to 4, wherein the lactone is more preferably selected from the group consisting of delta-valerolactone, gammavalerolactone, epsilon-caprolactone, and mixtures of two or more of these lactones, more preferably the lactone comprises at least, more preferably is, gamma-valerolactone. R ² represents a methyl group or a vinyl group and the residue R ² , if present, is positioned at a carbon atom of the ring structure, including any one of the C atoms of the group -[CH2]n-. For example, delta-valerolactone is a six-membered ring with 5 carbon atoms (y = 0), while gamma- valerolactone is a five-membered ring with four carbon atoms and a methyl group as R ² positioned at the C atom adjacent to the oxygen atom of the -O- bond (y = 1 and R ² = CH3), aka 5-methyloxolan-2-one.

In some preferred embodiments of the coated substrate, the vinylacetate has formula (III)

0

A

H ₃ C ^X ^O ^X ^CH ₂

(III)

In some preferred embodiments of the coated substrate, the polyvinylpyrrolidone has a weight average molecular weight of > 222 g/mol, more preferably in the range of from 2,500 to 2,500,000 g/mol, more preferably in the range of from 6,000 to 40,000 g/mol.

In some preferred embodiments of the coated substrate, the C5 to C8 alkyne is a straight or branched C5 to C8 alkyne, more preferably a straight chain C5 to C8 alkyne, which more preferably has formula (V) wherein r is an integer in the range of from 2 to 5, preferably r is 5.

In some preferred embodiments of the coated substrate, at least 80 weight-%, more preferably at least 90 weight-%, more preferably at least 95 weight-% of the compound used for depositing the coating are a compound of one of the groups as defined above, based on the total weight of all compounds used for depositing the coating, i.e. at least 80 weight-%, preferably at least 90 weight-%, more preferably at least 95 weight-% of the coating consists of a reaction product of a compound of one of the groups as described above. In some embodiments, where the coating is made from vinylacetate, wherein preferably at least 80 weight-%, preferably at least 90 weight-%, more preferably at least 95 weight-% of the compound used for depositing the coating is vinylacetate, based on the total weight of all compounds used for depositing the coating, i.e. at least 80 weight-%, preferably at least 90 weight-%, more preferably at least 95 weight-% of the coating consists of a reaction product of vinylacetate, the reaction product is then in these embodiments at least partially hydrolysed to give vinylalcohol copolymer. The hydrolysis is in some embodiments done by exposing the coating comprising the reaction product of vinylacetate in a subsequent step, i.e. after step completion of the plasma-assisted deposition method, preferably after step (d) as described below, to a humid ammonia-containing atmosphere. For example, an aqueous solution of NHs having a concentration in the range of from 0.1 to 50 weight-%, preferably in the range of from 0.5 to 25 weight-%, ammonia in water, based on the aqueous solution having 100 weight-%, is presented at a temperature of 50 °C (and at a pressure of 1013 mbar) and the coating is exposed to the resulting atmosphere.

Copolymers

In some preferred embodiments of the coated substrate, a further compound is used for depositing the coating on the surface of the substrate by a plasma-assisted deposition method, which is selected from the group consisting of C2 to C4 alkene, C2 to C4 alkyne and mixtures thereof, more preferably from the group consisting of C3 to C4 alkene, C2 to C4 alkyne and mixtures thereof, preferably the compound used for depositing the coating on the surface of the substrate by a plasma-assisted deposition method comprises at least vinylacetate and the further compound is acetylene, more preferably the compound used for depositing the coating on the surface of the substrate by a plasma-assisted deposition method is vinylacetate and the further compound is acetylene.

In some preferred embodiments of the coated substrate, in the range of from 50 to 90 weight-%, more preferably in the range of from 80 to 90 weight-%, of the compound used for depositing the coating are a compound of one of the groups as described above, based on the total weight of all compounds used for depositing the coating and in the range of from 10 to 50 weight-%, preferably in the range of from 10 to 20 weight-%, are a further compound as defined above. In some embodiments where a further compound is used, a copolymer is formed from vinylacetate and one or more further compound(s) selected from C2 to C4 alkene, C2 to C4 alkyne and mixtures thereof. Said copolymer is then in some embodiments at least partially hydrolyzed to convert the part based on vinylacetate in the copolymer to vinylalcohol. In these embodiments where a further compound is used, at least 80 weight-%, preferably at least 90 weight-%, more preferably at least 95 weight-% of the compound used for depositing the coating are a compound of one of the above-identified groups and the further compound, preferably vinylacetate and one or more further compound(s) selected from C2 to C4 alkene, C2 to C4 alkyne and mixtures thereof, based on the total weight of all compounds used for depositing the coating, i.e. at least 80 weight-%, preferably at least 90 weight-%, more preferably at least 95 weight-% of the coating consists of a reaction product of a compound of one of the above- identified groups and the further compound, more preferably at least 90 weight-%, more preferably at least 95 weight-% of the coating consists of a reaction product of vinylacetate and one or more further compound(s) selected from C2 to C4 alkene, C2 to C4 alkyne and mixtures thereof. Hydrolysis is in some embodiments done by exposing the coating comprising the reaction product of vinylacetate and the one or more further compound(s) selected from C2 to C4 alkene, C2 to C4 alkyne and mixtures thereof in a subsequent step, i.e. after step completion of the plasma-assisted deposition method, preferably after step (d) as described below, to a humid ammonia containing atmosphere. For example, an aqueous solution of NH3 having a concentration in the range of from 0.1 to 50 weight-%, preferably in the range of from 0.5 to 25 weight-%, ammonia in water, based on the aqueous solution having 100 weight-%, is presented at a temperature of 50 °C (and at a pressure of 1013 mbar) and the coating is exposed to the resulting atmosphere.

State of the precursor

In some preferred embodiments of the coated substrate, the fluorine-free compound is used as a precursor in the plasma-assisted deposition method in the form of a liquid phase, which comprises either a single compound in liquid state or a homogeneous solution in a liquid medium, wherein liquid means liquid at 25 °C and 1013 mbar. A liquid medium is a polar organic solvent except water. In some embodiments, the liquid medium is selected from the group consisting of C1 to C5 alkanols and their mixtures, preferably at least 95 weight-%, more preferably at least 98 weight-%, more preferably at least 99 weight-%, more preferably at least 99.5 weight-%, more preferably at least 99.9 weight-%, more preferably at least 99.95 weight- %, more preferably at least 99.99 weight-%, of the liquid medium are a polar organic solvents except water and their mixtures.

Free of fluorine

In some preferred embodiments of the coated substrate, the coating is substantially free of fluorine, more preferably the coating comprises less than 1 weight-%, more preferably less than 0.1 weight-%, of fluorine based on the total weight of the coating being 100 weight-%.

Further properties of the coating

In some preferred embodiments of the coated substrate, the retention time for toluene vapor is in the range of from 30 to 250 minutes, more preferably in the range of from 35 to 200 minutes, more preferably in the range of from 40 to 175 minutes, determined by Inverse Gas Chromatography (iGC) according to Reference Example 5.

In some preferred embodiments of the coated substrate, the monolayer binding capacity qBET is in the range of from 0.3 to 1.3 pmol/cm ² , preferably in the range of from 0.4 to 1.1 pmol/cm ² , more preferably in the range of from 0.5 to 0.8 pmol/cm ² , determined for toluene vapor by Inverse Gas Chromatography (iGC) according to Reference Example 5, and/or the BET constant CBET is in the range of from 50 to 300, preferably in the range of from 50 to 200, more preferably in the range of from 70 to 175, determined by Inverse Gas Chromatography (IGC) for toluene vapor according to Reference Example 5. QBET describes the monolayer binding capacity, i.e. the number of binding sites for toluene on the investigated surface, and is expressed as molar amounts of adsorbed toluene molecules per unit of explored surface area in pmol/cm ² , whereas CBET indicates the strength of binding. Strong barrier against toluene vapor is reflected by low values for q _B ET and/or CBET. PBET of the fluorine-free compounds according to the invention is in the same range as q _B ET of a comparative coating made from a fluorine- containing compound such as Freon R-134a or F2 gas, which have q _B ET values of about 0.5 pmol/cm ² . Compared to an uncoated substrate, which has a q _B ET of about 1.6 pmol/cm ² , the monolayer capacity is improved (i.e. further reduced) by the coating with fluorine-free compounds according to the invention by at least 20 %, preferably by at least 30 %. CBET of the fluorine-free compounds according to the invention is in the same range as CBET of a comparative coating made from a fluorine-containing compound such as Freon R-134a or F2 gas, which have CBET values in the range of from 70 to 90. It also has to be noted that the monolayer binding capacity qBET of, for example, plasma-assisted coatings based on epsilon- caprolactam (qBET = 0.53 pmol/cm ² ), is completely comparable to a conventional barrier technology obtained by coextrusion of HDPE and PA-6 (qBET = 0.50 pmol/cm ² ). Also CB T is comparable: plasma-assisted coatings based on epsilon-caprolactam have a CBET value of 74, while a PE/PA coextrudate has a C _BE T value of 80.

In some preferred embodiments of the coated substrate, the static contact angle against water for the fluorine-free compound being a lactam with 4 to 8 ring atoms, a lactone with 4 to 8 ring atoms, vinylacetate, or polyvinylpyrrolidone is in the range of from 10 to 46° determined according to Reference Example 2, whereas the static contact angle for a C5 to C8 alkyne against water is in the range of from 90 to 120° determined according to Reference Example 2, and/or the static contact angle against diiodomethane is in the range of from 10 to 40° for the fluorine-free compound being a lactam with 4 to 8 ring atoms, a lactone with 4 to 8 ring atoms, vinylacetate, or polyvinylpyrrolidone determined according to Reference Example 2, whereas the static contact angle for a C5 to C8 alkyne against diiodomethane is in the range of from 40 to 55° determined according to Reference Example 2, and/or the static contact angle against formamide for the fluorine-free compound being a lactam with 4 to 8 ring atoms, a lactone with 4 to 8 ring atoms, vinylacetate, or polyvinylpyrrolidone is in the range of from 8 to 15° determined according to Reference Example 2, whereas the static contact angle for a C5 to C8 alkyne against formamide is in the range of from 70 to 80° determined according to Reference Example 2.

In some preferred embodiments of the coated substrate, the surface free energy derived according to Reference Example 2 from static contact angles of water, formamide and diiodomethane is in the range of from 48 to 73 mN/m for the fluorine-free compound being a lactam with 4 to 8 ring atoms, a lactone with 4 to 8 ring atoms, vinylacetate, or polyvinylpyrrolidone, whereas the surface free energy derived according to Reference Example 2 from static contact angles of water, formamide and diiodomethane for a C5 to C8 alkyne is in the range of from 30 to 40 mN/m. In some preferred embodiments of the coated substrate, the coating has a thickness in the range of from 20 to 500 nm, preferably in the range of from 50 to 350 nm, preferably determined by transmission electron microscopy (TEM) according to Reference Example 6.

In some preferred embodiments of the coated substrate, the coating comprising the reaction product of the fluorine-free compound is present on at least parts of the substrate’s surface, preferably with a surface coverage determined by X-ray photoelectron spectroscopy (XPS) according to Reference Example 3 of at least 10 %, more preferred at least 20 %, more preferred at least 25 %, more preferred at least 30 %, of the area of the substrate’s surface, which has been treated with the plasma-assisted deposition method.

In some preferred embodiments of the coated substrate, the reaction product of the fluorine-free compound comprised in the coating is a radical polymerization product (in contrast to polycondensation) as determined by Time-of-Flight Secondary Ion Mass Spectrometry (ToF- SIMS) according to Reference Example 4 as characterized by a shift of the nominal masses of the secondary ions by 2 amu that are created from such surface in comparison to the nominal masses of fragments that are created from the measurement of a polymer created by polycondensation.

Intermediate acetylene-based layer

In some preferred embodiments of the coated substrate, a layer comprising a reaction product of acetylene is present between the substrate’s surface and the coating comprising a reaction product of the fluorine-free compound. In some preferred embodiments of the coated substrate, the layer comprising a reaction product of acetylene is obtained or obtainable from a plasma- assisted deposition of acetylene.

Substrate

In some preferred embodiments of the coated substrate, the substrate comprises a material selected from the group consisting of organic material and mixtures of organic material and inorganic material, wherein the organic material is preferably one or more organic polymer(s) and the inorganic material is preferably selected from the group consisting of glass, silica, ceramics and steel.

In some preferred embodiments of the coated substrate, the substrate comprises an organic polymer selected from the group consisting of polyolefin, preferably polyethylene (PE) or polypropylene (PP); polyamide (PA); polyurethane (PU); fluorinated polymer; silicone; polycarbonate (PC); polymethylmethacrylate (PM MA); polyacrylate; polyesters, especially polyethylene terephthalate (PET); cellulose; cellulose-derived polymers like cellulose acetate, lignin, lignin-based composites including wood; and mixtures of two or more of these organic polymers. In some preferred embodiments of the coated substrate, the substrate comprises an organic polymer selected from the group consisting of polyolefin, polyamide, polyester, and mixtures of two or more thereof, more preferred the substrate comprises an organic polymer selected from the group consisting of polyethylene, polyamide and mixtures of polyethylene and polyamide, more preferred the substrate comprises at least polyethylene (PE), more preferred high-density polyethylene (HDPE), more preferred at least 80 weight-%, more preferred at least 90 weight- %, more preferred at least 95 weight-%, more preferred at least 98 weight-% of the substrate consists of HDPE. High-density polyethylene (HDPE) has preferably a density in the range from 940 to 970 kg/m ³ .

In some preferred embodiments of the coated substrate, the substrate is a packaging suitable for storing and transporting a good selected from the group consisting of food, beverage and chemical, wherein the chemical is preferably a hazardous substance (transported as dangerous good) or an agrochemical, wherein the coating is present on at least a surface of the substrate that faces or is intended for facing the good. A hazardous substance is a substance which has to be transported as dangerous goods according to ADR/RID (ADR = International Agreement concerning the International Carriage of Dangerous Goods by Road, RID = Regulations concerning the International Carriage of Dangerous Goods by Rail) and/or I MDG (International Maritime Dangerous Goods Code) and/or IATA (International Air Transport Association). The good is more preferably an agrochemical, and the substrate is more preferably an (agro)chemical container, wherein the coating is present on at least a surface of the substrate that faces or is intended for facing the (agro)chemical. For example, if the substrate is a container in which (agro)chemicals are to be filled in, the coating is present on at least a part of the inner surface of the container. In some preferred embodiments of the coated substrate, said coated substrate is an agrochemical container.

Process steps and parameters - atmospheric plasma

In some preferred embodiments of the coated substrate, the plasma-assisted deposition method comprises

(a) providing a substrate having a surface;

(b) generating a plasma under plasma-generating conditions by passing a carrier gas through an excitation zone and by applying high-frequency alternating current to an electrode positioned in the excitation zone to produce a dielectric barrier discharge thereby generating a plasma;

(c) generating an aerosol comprising a fluorine-free compound as defined above by using an atomizer gas;

(d) treating at least a part of the substrate surface provided according to (a) with the plasma generated according to (b) and the aerosol comprising the fluorine-free compound generated according to (c), thereby depositing a reaction product of the fluorine-free compound on the treated part of the substrate surface thereby obtaining a coated substrate. In some preferred embodiments of the coated substrate, in the plasma-assisted deposition method, the plasma is generated in (a) at a pressure in the range from 0.5 to 1 .5 bar, more preferably in the range from 0.8 to 1 .2 bar (atmospheric or near-atmospheric conditions, indirect atmospheric pressure plasma processing), i.e. the plasma generated in (b) and used in (d) is an atmospheric plasma.

A “carrier gas” means typically a gas suitable for generating and maintaining a dielectric barrier discharge (DBD) plasma. In particular, the carrier gas is selected from the group consisting of N ₂ , Ar, He, CO ₂ , O ₂ , N ₂ O or a mixture of two or more of these gases. The term “atomizer gas” typically means the gas used to nebulize or to create an aerosol in the atomizer as well as to transport the aerosol to and into the plasma. In particular, the atomizer gas is selected to be the same as the carrier gas.

In some embodiments, the plasma-assisted deposition method is preferably an indirect plasma treatment, for example, as in the PlasmaLine®, wherein the plasma is blown out from the zone between the electrodes where it is generated. Therein, the plasma according to (b) is preferably generated in a first zone, more preferred in a plasma discharge chamber; wherein preferably, the plasma is generated under plasma-generating conditions by passing a carrier gas through an excitation zone consisting of a grounded electrode and a high voltage electrode and by applying high frequency alternating current to the high voltage electrode to produce a dielectric barrier discharge thereby generating an atmospheric plasma. The aerosol comprising the at least one fluorine-free compound is generated according to (c) preferably in a second zone (atomizer zone), and the treatment according to (d) is preferably done in a third zone, which is more preferred a so-called afterglow chamber, which is positioned downstream of the plasma discharge chamber and in fluid communication with an outlet of the plasma discharge chamber. The build-up of devices for such an indirect plasma treatment is known to a skilled person and is described, for example, in WO 2006/081637 A1 (Vito) or in Vangeneugden et al, “Atmospheric DBD plasma processes for production of lightweight composites” published at the 21st International Symposium on Plasma Chemistry (https://www.ispc- conference.org/ispcproc/ispc21/ID287.pdf). Normally, a transport means is provided for continuous transport of the substrate through the afterglow chamber and such that the substrate is kept remote from the plasma discharge chamber while being processed by plasma-activated species in the afterglow chamber. Alternatively, the plasma-assisted deposition method is a PlasmaSpot® (often called plasma jet) method, which also uses an indirect plasma treatment.

In some preferred embodiments of the coated substrate, step (c) of the plasma-assisted deposition method comprises

(c.1) providing the fluorine-free compound in liquid form in a vessel having an outlet;

(c.2) passing an atomizer gas through a nozzle so that the atomizer gas gets in contact with the fluorine-free compound at the outlet of the vessel, thereby generating an aerosol comprising the fluorine-free compound.

The vessel, in which the at least one fluorine-free compound in liquid form is provided, is not particularly limited with respect to its dimensions and/or its shape. In some embodiments, the vessel is a reservoir with a capillary therein, wherein the capillary is in contact with the liquid and protrudes from the vessel. The opening of the capillary at its side protruding from the vessel forms the outlet. In these embodiments, the atomizer gas coming from the nozzle -which has a specific diameter- passes almost horizontally along the outlet of the capillary, i.e. approximately vertically with respect to the capillary (“approximately vertically” means that the flow direction of the atomizer gas before passing the capillary and the capillary form an angle in the range from 45 to 135°, preferably an angle in the range from 75 to 105°, more preferred an angle in the range from 80 to 100°, more preferred in the range of from 85 to 95°, more preferred in the range from 88 to 92°), thus causing an underpressure within the outlet (Venturi effect), whereby liquid is sucked from the nozzle into the atomizer gas stream. The atomizer gas is preferably present in compressed form before passing the nozzle and expands after passing the nozzle. In some embodiments, a tube is arranged approximately vertically with respect to the atomizer gas stream, into which the atomizer gas enters through an opening after passing the outlet of the capillary (“approximately vertically” means that the flow direction of the atomizer gas before entering the tube through the opening and the tube form an angle in the range from 45 to 135°, preferably an angle in the range from 75 to 105°, more preferred an angle in the range from 80 to 100°, more preferred in the range of from 85 to 95°, more preferred in the range from 88 to 92°). The atomizer gas comprising the at least one fluorine-free compound in the form of liquid droplets of different sizes then collides with the inner wall of the tube, which is opposite to the opening. Thereby, larger droplets are removed, preferably by falling down in the tube, while the aerosol containing smaller droplets passes further through the tube, preferably in upwards direction. The aerosol which passes, preferably upwards, through the tube comprises the at least one fluorine-free compound in the form of liquid droplets, which have a specific size ranging from 1 to 1000 nm, preferably in the range from 5 to 400 nm, more preferred in the range from 10 to 200 nm.

The fluorine-free compound in embodiments with atmospheric plasma is preferably as defined above. More preferably, the fluorine-free compound is epsilon-caprolactam.

In embodiments related to the atmospheric plasma variant, the plasma according to (a) is preferably generated with a power per electrode area of less than 40 kW/m ² , more preferably with a power in the range from 7.5 to 38 kW/m ² , more preferred in the range from 8 to 30 kW/m ² . In embodiments related to the atmospheric plasma variant, one or more atomizers, preferably at least two atomizers are used, wherein the atomizer gas according to (c) or (c.2) is preferably provided into the second zone with a flow per atomizer of more than 0.5 slm (standard liter per minute), more preferably with a flow per atomizer in the range from 0.5 to 5 slm, more preferred in the range from 0.8 to 3 slm, more preferred in the range from 1 to 2 slm. In embodiments related to the atmospheric plasma variant, the amount of the fluorine-free compound transported as aerosol to and into the plasma per time is preferably in the range from 0.045 to 0.5 g/min per atomizer, more preferably in the range from 0.045 to 0.3 g/min per atomizer, more preferred in the range from 0.05 to 0.2 g/min per atomizer, more preferred in the range from 0.08 to 0.12 g/min per atomizer.

The amount of the at least one fluorine-free compound transported as aerosol to and into the plasma per time is also called the mass flow of the at least one fluorine-free compound transported as aerosol to and into the plasma. The mass flow is determined in that the amount of the at least one fluorine-free compound present in the second zone, preferably within a vessel in the second zone, is determined at a time to before the atomizer gas according to (c) is provided into the second zone, and the amount of the at least one fluorine-free compound in the second zone, preferably within the vessel in the second zone, is again determined after a time ti during which atomizer gas according to (c) has been provided into the second zone. The mass flow (mf) is determined according to mf = [amount(to)-amount(ti)]/[ti-to]]

The mass flow can further be normalized to the applied plasma power, giving a power density- related mass flow in in the range from 0.001 to 0.02 (g*m ² )/(kW*min), preferably in the range from 0.003 to 0.015 (g*m ² )/(kW*min), more preferred in the range from 0.005 to 0.012 (g*m ² )/(kW*min).

In embodiments related to the atmospheric plasma variant, the outlet of the excitation zone is preferably in a distance from the substrate surface according to (a) in the range from 0.5 to 10 mm, more preferably in the range from 0.5 to 5 mm, more preferred in the range from 2 to 4 mm, more preferred in the range from 2.5 to 3.5 mm. In embodiments related to the atmospheric plasma variant, in the plasma-assisted deposition method, the carrier gas is provided to the excitation zone preferably with a flow in the range from 50 to 500 l/min, more preferably in the range from 150 to 450 l/min, more preferred in the range from 200 to 300 l/min.

The plasma for use in the atmospheric plasma variant is a non-equilibrium plasma such as generated by alternating current (ac) discharge. Alternatively, the plasma is another nonequilibrium plasma such as those generated by radiofrequency (rf) excitation, microwave (mw) excitation, or direct current (de) discharge.

In embodiments related to the atmospheric plasma variant, preferably alternating voltages up to 100 kV are applied, wherein the alternating voltage is more preferably in the range of 10 to 40 kV. In embodiments related to the atmospheric plasma variant, the discharge frequency is preferably in the range from 50 to 100 kHz, more preferably in the range from 60 to 100 kHz, more preferred in the range from 70 to 95 kHz, more preferred in the range from 80 to 90 kHz.

Preferably, the substrate is passed through the third zone (afterglow chamber) more than one time (number of passes > 1); preferably the number of passes is in the range from 5 to 100, more preferred in the range from 10 to 50. The speed, with which the substrate is passed is preferably in the range from 0.1 to 10 m/min, more preferred in the range from 1 to 3 m/min. In other embodiments, the substrate is passed through one or more, substantially identical third zones (afterglow chambers); preferably through x substantially identical third zones, wherein x is an integer from the range from 5 to 100, more preferred in the range from 10 to 50. The speed, with which the substrate is passed through each of the one or more or the x substantially identical third zones is preferably in the range from 0.1 to 10 m/min, more preferred in the range from 1 to 3 m/min. In embodiments related to the atmospheric plasma variant, the plasma- assisted deposition method is preferably carried out for a total time in the range of from 30 seconds to 10 minutes, more preferably in the range of from 1 to 2 minutes.

In embodiments related to the atmospheric plasma variant, the plasma-assisted deposition method is preferably carried out at a temperature in the range of from 10 to 80 °C.

Process steps and parameters - tow pressure plasma

In some alternative preferred embodiments of the coated substrate, in the plasma-assisted deposition method, the plasma is generated at a pressure of <0.1 mbar, preferably in the range from 0.0001 to 0.09 mbar, preferably in the range from 0.001 to 0.05 mbar (low pressure plasma).

Preferably, in these alternative preferred embodiments related to low pressure plasma, the plasma-assisted deposition method comprises

(a) providing a substrate having a surface;

(b’) generating an aerosol comprising a fluorine-free compound as defined above, preferably by using an atomizer gas;

(c’) transforming the precursor aerosol generated in (b’) into a plasma state by a combination of excitations comprising a main excitation by means of microwave-type electromagnetic waves, and a secondary excitation by means of an electric discharge of alternating voltage having a frequency between 1 kHz and 15 MHz, thereby generating a plasma;

(d’) treating at least a part of the substrate surface provided according to (a) with the plasma generated according to (c’), thereby depositing a reaction product of the fluorine-free compound on the treated part of the substrate surface thereby obtaining a coated substrate.

As indicated above, the plasma generated in (o’) is a lowpressure plasma. Preferably, the alternating voltage has a frequency between 10 and 200 kHz. Microwaves are electromagnetic waves with a frequency between 300 and 3000 MHz, preferably, a frequency between 915 and 2450 MHz.

Preferably, in these alternative preferred embodiments, step (c’) of the plasma-assisted deposition method comprises

(c’.a) providing the fluorine-free compound in liquid form, optionally with application of heating, in a vessel having an outlet;

(c’.b) passing an atomizer gas through a nozzle so that the atomizer gas gets in contact with the fluorine-free compound at the outlet of the vessel, thereby generating an aerosol comprising the fluorine-free compound.

In alternative preferred embodiments related to low pressure plasma, the plasma-assisted deposition method comprises

(a) providing a substrate having a surface; (b”) providing an atmosphere comprising a fluorine-free compound in gaseous form or aerosol form, optionally under application of heating;

(c”) generating a plasma from the atmosphere comprising the fluorine-free compound according to (b”) under plasma-generating conditions by a combination of excitations comprising a main excitation by means of microwave-type electromagnetic waves, and a secondary excitation by means of an electric discharge of alternating voltage having a frequency between 1 kHz and 15 MHz, thereby generating a plasma;

(d”) treating at least a part of the substrate surface provided according to (a) with the plasma generated according to (c”), thereby depositing a reaction product of the fluorine-free compound on the treated part of the substrate surface thereby obtaining a coated substrate.

The atmosphere comprises the fluorine-free compound and optionally one or more gases, preferably selected from the group consisting of N ₂ , Ar, He, CO ₂ , O ₂ , N ₂ O or a mixture of two or more of these gases. The atmosphere comprising the fluorine-free compound in gaseous form or aerosol form is, for example, provided in that the fluorine-free compound, due to the vapor pressure it has in its liquid form, is partially gaseous and the gaseous phase is transferred to the vessel used for plasma generation and treatment, either in combination with a carrier gas or alone, or a liquid fluorine-free compound or a solution in a solvent of a liquid fluorine-free compound is injected into the vessel used for plasma generation and treatment.

For embodiments related to the low pressure variant without use of an atomizer gas (and without use of an aerosol), reference is made to US 2022/0112595 A1 , where said process is described in detail, which is incorporated herein by reference, especially paragraphs [0010] to [0020], [0024] to [0028], A suitable device is described in US 2022/0112595 A1 in paragraphs [0031] to [0060], which are also incorporated herein by reference.

In all embodiments where a low pressure plasma is used, the substrate to be coated, may it be the inner surface or parts thereof of a hollow container with an opening, the substrate is preferably placed in an enclosure, which is suitable for maintaining a specific pressure therein and the whole enclosure is evacuated.

In these embodiments related to the low pressure plasma variant, the fluorine-free compound is preferably selected from the group consisting of a lactam with 4 to 8 ring atoms, a lactone with 4 to 8, preferably 6 to 8, ring atoms, vinylacetate, polyvinylpyrrolidone, and mixtures of two or more of these compounds, more preferably from the group consisting of lactam with 4 to 8 ring atoms excluding caprolactam, a lactone with 4 to 8, preferably 6 to 8, ring atoms, vinylacetate, polyvinylpyrrolidone, and mixtures of two or more of these compounds, more preferably from the group consisting of lactam with 4 to 8 ring atoms excluding caprolactam and excluding vinylpyrrolidone, a lactone with 4 to 8, preferably 6 to 8, ring atoms, vinylacetate, polyvinylpyrrolidone, and mixtures of two or more of these compounds, more preferably from the group consisting of a lactone with 4 to 8, preferably 6 to 8, ring atoms, vinylacetate, polyvinylpyrrolidone, and mixtures of two or more of these compounds, more preferably from the group consisting of a lactone with 4 to 8 ring atoms, vinylacetate, and mixtures of two or more of these compounds, more preferably the fluorine-free compound is a lactone with 4 to 8, preferably 6 to 8, ring atoms.

In some preferred embodiments of the coated substrate related to the low pressure plasma variant, a further compound is used for depositing the coating on the surface of the substrate by a plasma-assisted deposition method, which is selected from the group consisting of C2 to C4 alkene, C2 to C4 alkyne and mixtures thereof, more preferably from the group consisting of C3 to C4 alkene, C2 to C4 alkyne and mixtures thereof, preferably the compound used for depositing the coating on the surface of the substrate by a plasma-assisted deposition method comprises at least vinylacetate and the further compound is acetylene, more preferably the compound used for depositing the coating on the surface of the substrate by a plasma-assisted deposition method is vinylacetate and the further compound is acetylene.

In some preferred embodiments of the coated substrate related to the low pressure plasma variant, in the range of from 50 to 90 weight-%, more preferably in the range of from 80 to 90 weight-%, of the compound used for depositing the coating are a compound of one of the groups as described above, based on the total weight of all compounds used for depositing the coating and in the range of from 10 to 50 weight-%, preferably in the range of from 10 to 20 weight-%, are a further compound as defined above. In some embodiments where a further compound is used, a copolymer is formed from vinylacetate and one or more further compound(s) selected from C2 to C4 alkene, C2 to C4 alkyne and mixtures thereof. Said copolymer is then in some embodiments at least partially hydrolyzed to convert the part based on vinylacetate in the copolymer to vinylalcohol. In these embodiments where a further compound is used, at least 80 weight-%, preferably at least 90 weight-%, more preferably at least 95 weight-% of the compound used for depositing the coating are a compound of one of the above-identified groups and the further compound, preferably vinylacetate and one or more further compound(s) selected from C2 to C4 alkene, C2 to C4 alkyne and mixtures thereof, based on the total weight of all compounds used for depositing the coating, i.e. at least 80 weight-%, preferably at least 90 weight-%, more preferably at least 95 weight-% of the coating consists of a reaction product of a compound of one of the above-identified groups and the further compound, more preferably at least 90 weight-%, more preferably at least 95 weight-% of the coating consists of a reaction product of vinylacetate and one or more further compound(s) selected from C2 to C4 alkene, C2 to C4 alkyne and mixtures thereof. Hydrolysis is in some embodiments done by exposing the coating comprising the reaction product of vinylacetate and the one or more further compound(s) selected from C2 to C4 alkene, C2 to C4 alkyne and mixtures thereof in a subsequent step, i.e. after step completion of the plasma- assisted deposition method, preferably after step (d) as described below, to a humid ammonia containing atmosphere. For example, an aqueous solution of NH3 having a concentration in the range of from 0.1 to 50 weight-%, preferably in the range of from 0.5 to 25 weight-%, ammonia in water, based on the aqueous solution having 100 weight-%, is presented at a temperature of 50 °C (and at a pressure of 1013 mbar) and the coating is exposed to the resulting atmosphere.

In some preferred embodiments of the coated substrate related to the low pressure plasma variant, a layer comprising a reaction product of acetylene is present between the substrate’s surface and the coating comprising a reaction product of the fluorine-free compound. In some preferred embodiments of the coated substrate related to the low pressure plasma variant, the layer comprising a reaction product of acetylene is obtained or obtainable from a plasma- assisted deposition of acetylene.

In these embodiments related to the low pressure plasma variant, the power density of electromagnetic waves is in the range of from 0.01 to 1 W/cm ³ and/or the power of the electric discharge is in the range of from 4 to 30 W and the frequency is in the range of from 20 to 200 kHz.

In embodiments related to the low pressure plasma variant, the plasma-assisted deposition method is preferably carried out at a temperature in the range of from 10 to 80 °C. That is, “under application of heating” means that a temperature is established by suitable means in the range of from 10 to 80°C so that the fluorine-free compound can be provided in liquid form or gaseous form.

Irrespective whether an atmospheric plasma variant or a low pressure plasma variant is used in the plasma-assisted deposition method, preferably in none of steps (a), (b), (c), (d), more preferably at least not in step (d), water is added and/or the plasma-assisted deposition method, preferably at least step (d) thereof, is carried out in an atmosphere containing at the outmost as much water as contained in the atmosphere based on a relative humidity (RH) of 100 % at the respective process temperature.

2 ^nd aspect of the invention - Process

The invention relates in a second aspect to a plasma-assisted deposition method for applying a coating onto a surface of a substrate comprising:

(a) providing a substrate having a surface;

(b) generating a plasma under plasma-generating conditions by passing a carrier gas through an excitation zone and by applying high-frequency alternating current to an electrode positioned in the excitation zone to produce a dielectric barrier discharge thereby generating a plasma;

(c) generating an aerosol comprising a fluorine-free compound as defined in any one of the embodiments described above for the first aspect of the invention by using an atomizer gas;

(d) treating at least a part of the substrate surface provided according to (a) with the plasma generated according to (b) and the aerosol comprising the fluorine-free compound generated according to (c), thereby depositing a reaction product of the fluorine-free compound on the treated part of the substrate surface thereby obtaining a coated substrate.

In some preferred embodiments of the plasma-assisted deposition method for applying a coating onto a surface of a substrate, step (c) of the plasma-assisted deposition method comprises (c.1) providing the fluorine-free compound in liquid form in a vessel having an outlet;

(c.2) passing an atomizer gas through a nozzle so that the atomizer gas gets in contact with the fluorine-free compound at the outlet of the vessel, thereby generating an aerosol comprising the fluorine-free compound.

Atmospheric plasma

In some preferred embodiments of the plasma-assisted deposition method for applying a coating onto a surface of a substrate, the plasma is generated in (a) at a pressure in the range from 0.5 to 1.5 bar, preferably in the range from 0.8 to 1 .2 bar (atmospheric or near-atmospheric conditions, indirect atmospheric pressure plasma processing).

In these embodiments of the plasma-assisted deposition method related to use of atmospheric plasma, the plasma according to (a) is preferably generated with a power per electrode area of less than 40 kW/m ² , more preferably with a power in the range from 7.5 to 38 kW/m ² , more preferred in the range from 8 to 30 kW/m ² . In these embodiments of the plasma-assisted deposition method related to use of atmospheric plasma, one or more atomizers, preferably at least two atomizers are used, wherein the atomizer gas according to (c) or (c.2) is preferably provided into the second zone with a flow per atomizer of more than 0.5 slm (standard liter per minute), more preferably with a flow per atomizer in the range from 0.5 to 5 slm, more preferred in the range from 0.8 to 3 slm, more preferred in the range from 1 to 2 slm. In these embodiments of the plasma-assisted deposition method related to use of atmospheric plasma, the amount of the fluorine-free compound transported as aerosol to and into the plasma per time is in the range from 0.045 to 0.5 g/min per atomizer, more preferably in the range from 0.045 to 0.3 g/min per atomizer, more preferred in the range from 0.05 to 0.2 g/min per atomizer, more preferred in the range from 0.08 to 0.12 g/min per atomizer. In these embodiments of the plasma-assisted deposition method related to use of atmospheric plasma, the outlet of the excitation zone is preferably in a distance from the substrate surface according to (a) in the range from 0.5 to 10 mm, more preferably in the range from 0.5 to 5 mm, more preferred in the range from 2 to 4 mm, more preferred in the range from 2.5 to 3.5 mm. In these embodiments of the plasma-assisted deposition method related to use of atmospheric plasma, the carrier gas is provided to the excitation zone preferably with a flow in the range from 50 to 500 l/min, more preferably in the range from 150 to 450 l/min, more preferably in the range from 200 to 300 l/min. In these embodiments of the plasma-assisted deposition method related to use of atmospheric plasma, preferably alternating voltages up to 100 kV are applied, wherein the alternating voltage is more preferably in the range of 10 to 40 kV. In these embodiments of the plasma-assisted deposition method related to use of atmospheric plasma, the discharge frequency is preferably in the range from 50 to 100 kHz, preferably in the range from 60 to 100 kHz, more preferred in the range from 70 to 95 kHz, more preferred in the range from 80 to 90 kHz. In these embodiments of the plasma-assisted deposition method related to use of atmospheric plasma, the plasma-assisted deposition method is preferably carried out at a temperature in the range of from 10 to 80 °C. In these embodiments of the plasma-assisted deposition method related to use of atmospheric plasma, the plasma-assisted deposition method is preferably carried out for a total time in the range of from 30 seconds to 10 minutes, more preferably in the range of from 1 to 2 minutes.

Low pressure plasma

In some alternative preferred embodiments of the plasma-assisted deposition method for applying a coating onto a surface of a substrate, the plasma is generated at a pressure of <0.1 mbar, preferably in the range from 0.0001 to 0.09 mbar, preferably in the range from 0.001 to 0.05 mbar (low pressure plasma).

In these alternative preferred embodiments related to low pressure plasma, the plasma-assisted deposition method according to one variant preferably comprises

(a) providing a substrate having a surface;

(b’) generating an aerosol comprising a fluorine-free compound as defined in any one of the embodiments related to the first aspect of the invention described above by using an atomizer gas;

(c’) transforming the precursor aerosol generated in (b’) into a plasma state by a combination of excitations comprising a main excitation by means of microwave-type electromagnetic waves, and a secondary excitation by means of an electric discharge of alternating voltage having a frequency between 1 kHz and 15 MHz, thereby generating a plasma;

(d’) treating at least a part of the substrate surface provided according to (a) with the plasma generated according to (c’), thereby depositing a reaction product of the fluorine-free compound on the treated part of the substrate surface thereby obtaining a coated substrate.

As indicated above, the plasma generated in (c) is a low pressure plasma. Preferably, alternating voltage has a frequency between 10 and 200 kHz. Microwaves are electromagnetic waves with a frequency between 300 and 3000 MHz, preferably, a frequency between 915 and 2450 MHz.

In these alternative preferred embodiments related to low pressure plasma, step (c) of the plasma-assisted deposition method according to one variant comprises

(c’.a) providing the fluorine-free compound in liquid form, optionally with application of heating, in a vessel having an outlet;

(c’.b) passing an atomizer gas through a nozzle so that the atomizer gas gets in contact with the fluorine-free compound at the outlet of the vessel, thereby generating an aerosol comprising the fluorine-free compound.

In alternative preferred embodiments related to low pressure plasma, the plasma-assisted deposition method according to another variant the plasma-assisted deposition method comprises

(a) providing a substrate having a surface;

(b”) providing an atmosphere comprising a fluorine-free compound in gaseous form or aerosol form, optionally under application of heating; (c”) generating a plasma from the atmosphere comprising the fluorine-free compound according to (b.1) under plasma-generating conditions by a combination of excitations comprising a main excitation by means of microwave-type electromagnetic waves, and a secondary excitation by means of an electric discharge of alternating voltage having a frequency between 1 kHz and 15 MHz, thereby generating a plasma;

(d”) treating at least a part of the substrate surface provided according to (a) with the plasma generated according to (c”), thereby depositing a reaction product of the fluorine-free compound on the treated part of the substrate surface thereby obtaining a coated substrate.

The atmosphere comprises the fluorine-free compound and optionally one or more gases, preferably selected from the group consisting of N ₂ , Ar, He, CO ₂ , O ₂ , N ₂ O or a mixture of two or more of these gases. The atmosphere comprising a fluorine-free compound in gaseous form or aerosol form is for example, provided in that the fluorine-free compound, due to the vapor pressure it has in its liquid form is partially gaseous and the gaseous phase is transferred to the vessel used for plasma generation and treatment, either in combination with a carrier gas or alone, or a liquid fluorine-free compound or a solution in a solvent of a liquid fluorine-free compound is injected into the vessel used for plasma generation and treatment.

For embodiments related to the low pressure variant without use of an atomizer gas (and without use of an aerosol), reference is made to US 2022/0112595 A1 , where said process is described in detail, which is incorporated herein by reference, especially paragraphs [0010] to [0020], [0024] to [0028], A suitable device is described in US 2022/0112595 A1 in paragraphs [0031] to [0060], which are also incorporated herein by reference.

In all embodiments where a low pressure plasma is used, the substrate to be coated, may it be the inner surface or parts thereof of a hollow container with an opening, the substrate is preferably placed in an enclosure, which is suitable for maintaining a specific pressure therein and the whole enclosure is evacuated.

In all embodiments where a low pressure plasma is used, the fluorine-free compound is preferably selected from the group consisting of a lactam with 4 to 8 ring atoms, a lactone with 4 to 8, preferably 6 to 8, ring atoms, vinylacetate, polyvinylpyrrolidone, and mixtures of two or more of these compounds, more preferably from the group consisting of lactam with 4 to 8 ring atoms excluding caprolactam, a lactone with 4 to 8, preferably 6 to 8, ring atoms, vinylacetate, polyvinylpyrrolidone, and mixtures of two or more of these compounds, more preferably from the group consisting of lactam with 4 to 8 ring atoms excluding caprolactam and excluding vinylpyrrolidone, a lactone with 4 to 8, preferably 6 to 8, ring atoms, vinylacetate, polyvinylpyrrolidone, and mixtures of two or more of these compounds, more preferably from the group consisting of a lactone with 4 to 8, preferably 6 to 8, ring atoms, vinylacetate, polyvinylpyrrolidone, and mixtures of two or more of these compounds, more preferably from the group consisting of a lactone with 4 to 8 ring atoms, vinylacetate, and mixtures of two or more of these compounds, more preferably the fluorine-free compound is a lactone with 4 to 8, preferably 6 to 8, ring atoms. In all embodiments where a low pressure plasma is used, the power density of electromagnetic waves is in the range of from 0.01 to 1 W/cm ³ and/or the power of the electric discharge is in the range of from 4 to 30 W and the frequency is in the range of from 20 to 200 kHz.

“Under application of heating” means that a temperature is established by suitable means in the range of from 10 to 80°C so that the fluorine-free compound can be provided in liquid form or gaseous form.

Irrespective whether an atmospheric plasma or a low pressure plasma is used in the plasma- assisted deposition method for applying a coating onto a surface of a substrate, preferably in none of steps (a), (b), (c), (d), more preferably at least not in step (d), water is added and/or wherein the plasma-assisted deposition method, preferably at least step (d) thereof, is carried out in an atmosphere containing at the outmost as much water as contained in the atmosphere based on a relative humidity (RH) of 100 % at the respective process temperature.

Irrespective whether an atmospheric plasma or a low pressure plasma is used in the plasma- assisted deposition method for applying a coating onto a surface of a substrate, the substrate comprises a material selected from the group consisting of organic material and mixtures of organic material and inorganic material, wherein the organic material is preferably one or more organic polymer(s) and the inorganic material is preferably selected from the group consisting of glass, silica, ceramics and steel. The organic polymer is preferably selected from the group consisting of polyolefin, preferably polyethylene (PE) or polypropylene (PP); polyamide (PA); polyurethane (PU); fluorinated polymer; silicone; polycarbonate (PC); polymethylmethacrylate (PMMA); polyacrylate; polyesters, especially polyethylene terephthalate (PET); cellulose; cellulose-derived polymers like cellulose acetate, lignin, lignin-based composites including wood; and mixtures of two or more of these organic polymers.

Irrespective whether an atmospheric plasma or a low pressure plasma is used in the plasma- assisted deposition method for applying a coating onto a surface of a substrate, the substrate more preferably comprises an organic polymer selected from the group consisting of polyolefin, polyamide, polyester, and mixtures of two or more thereof, more preferred the substrate comprises an organic polymer selected from the group consisting of polyethylene, polyamide and mixtures of polyethylene and polyamide, more preferred the substrate comprises at least polyethylene (PE), more preferred high-density polyethylene (HDPE).

Regarding properties of the coated substrate obtained, reference is made to the disclosure hereinabove related to the first aspect of the present invention, i.e. the properties of the coated substrate obtained are as disclosed in detail in the section above directed to the first aspect. Further, preferred embodiments of the method, as well as process parameters, are as disclosed in detail above with respect to the first aspect. Furthermore, the details disclosed above with respect to the first aspect regarding for example the atmospheric plasma variant and the low pressure variant apply also for the plasma-assisted deposition method of the second aspect. 3rd of the Invention - use

A third aspect of the invention relates to the use of a coated substrate as described above with respect to the first aspect or of a coated substrate obtained or obtainable from the plasma- assisted deposition method of the second aspect as described above, for packaging, storing and/or transporting a good selected from the group consisting of food, beverage and chemical wherein the good is preferably a chemical, wherein the chemical is preferably a hazardous substance (transported as dangerous good) or an agrochemical, more preferably an agrochemical.

The present invention is further illustrated by the following embodiments and combinations of embodiments as indicated by the respective dependencies and back-references. In particular, it is noted that in each instance where a range of embodiments is mentioned, for example in the context of a term such as "The ... of any of embodiments 1 to 4", every embodiment in this range is meant to be explicitly disclosed for the skilled person, i.e. the wording of this term is to be understood by the skilled person as being synonymous to "The ... of any of embodiments 1 , 2, 3, and 4".

1. A coated substrate, wherein the coating is obtained or obtainable from depositing on a surface of a substrate by a plasma-assisted deposition method a reaction product of a fluorine-free compound selected from the group consisting of a lactam with 4 to 8 ring atoms, a lactone with 4 to 8 ring atoms, vinylacetate, polyvinylpyrrolidone, C5 to 08 alkyne and mixtures of two or more of these compounds.

2. The coated substrate of embodiment 1 , wherein the compound used for depositing the coating on the surface of the substrate by a plasma-assisted deposition method is selected from the group consisting of a lactam with 4 to 8 ring atoms excluding vinylpyrrolidone, a lactone with 4 to 8 ring atoms, vinylacetate, polyvinylpyrrolidone, C5 to C8 alkyne and mixtures of two or more of these compounds.

3. The coated substrate of embodiment 1 or 2, wherein the compound used for depositing the coating on the surface of the substrate by a plasma-assisted deposition method is selected from the group consisting of a lactam with 4 to 8 ring atoms excluding vinylpyrrolidone, a lactone with 4 to 8 ring atoms, vinylacetate, C5 to C8 alkyne and mixtures of two or more of these compounds.

4. The coated substrate of any one of embodiments 1 to 3, wherein the compound used for depositing the coating on the surface of the substrate by a plasma-assisted deposition method is selected from the group consisting of a lactam with 4 to 8 ring atoms excluding vinylpyrrolidone, a lactone with 4 to 8 ring atoms, vinylacetate and mixtures of two or more of these compounds, preferably selected from the group consisting of a lactone with 4 to 8 ring atoms, vinylacetate and mixtures of two or more of these compounds. The coated substrate of any one of embodiments 1 to 4, wherein the lactam with 4 to 8 ring atoms has formula (I) wherein

R ¹ is a vinyl group, x is zero or 1 , and n is an integer in the range of from 2 to 5, preferably in the range of from 2 to 4, more preferably n is 4 and x is zero (epsilon-caprolactam) and/ or n is 2 and x is 1 , wherein R ¹ is a vinyl group substituting the hydrogen atom at the nitrogen of the ring structure (vinylpyrrolidone). The coated substrate of any one of embodiments 1 to 5, wherein the lactone with 4 to 8 ring atoms, preferably 6 to 8 ring atoms, has formula (II) wherein

R ² is selected from methyl group and vinyl group, y is zero or 1 , and m is an integer in the range of from 1 to 5, preferably in the range of from 3 to 4, wherein the lactone is more preferably selected from the group consisting of delta-valerolactone, gamma-valerolactone, epsilon-caprolactone, and mixtures of two or more of these lactones, more preferably the lactone comprises at least, more preferably is, gamma- valerolactone. The coated substrate of any one of embodiments 1 to 6, wherein vinylacetate has formula The coated substrate of any one of embodiments 1 to 7, wherein the polyvinylpyrrolidone has a weight average molecular weight of > 222 g/mol, preferably in the range of from 2,500 to 2,500,000 g/mol, more preferably in the range of from 6,000 to 40,000 g/mol. The coated substrate of any one of embodiments 1 to 8, wherein the C5 to C8 alkyne is a straight or branched C5 to C8 alkyne, preferably a straight chain C5 to C8 alkyne, which more preferably has formula (V) wherein r is an integer in the range of from 2 to 5, preferably r is 5.

10. The coated substrate of any one of embodiments 1 to 9, wherein at least 80 weight-%, preferably at least 90 weight-%, more preferably at least 95 weight-% of the compound used for depositing the coating are a compound of one of the groups according to embodiments 1 to 9, based on the total weight of all compounds used for depositing the coating, i.e. at least 80 weight-%, preferably at least 90 weight-%, more preferably at least 95 weight-% of the coating consists of a reaction product of a compound of one of the groups according to embodiments 1 to 9.

11 . The coated substrate of any one of embodiments 1 to 10, wherein a further compound is used for depositing the coating on the surface of the substrate by a plasma-assisted deposition method, which is selected from the group consisting of, C2 to C4 alkene, C2 to C4 alkyne and mixtures thereof, more preferably from the group consisting of C3 to C4 alkene, C2 to C4 alkyne and mixtures thereof, preferably the compound used for depositing the coating on the surface of the substrate by a plasma-assisted deposition method comprises at least vinylacetate and the further compound is acetylene, more preferably the compound used for depositing the coating on the surface of the substrate by a plasma-assisted deposition method is vinylacetate and the further compound is acetylene.

12. The coated substrate of embodiments 1 to 11 , wherein in the range of from 50 to 90 weight-%, preferably in the range of from 80 to 90 weight-%, of the compound used for depositing the coating are a compound of one of the groups according to embodiments 1 to 9, based on the total weight of all compounds used for depositing the coating and in the range of from 10 to 50 weight-%, preferably in the range of from 10 to 20 weight-%, are a further compound according to embodiment 11 .

13. The coated substrate of any one of embodiments 1 to 12, wherein the fluorine-free compound is used as a precursor in the plasma-assisted deposition method in the form of a liquid phase, which comprises either a single compound in liquid state or a homogeneous solution in a liquid medium.

14. The coated substrate of any one of embodiments 1 to 13, wherein the coating is substantially free of fluorine, preferably the coating comprises less than 1 weight-%, more preferably less than 0.1 weight-%, of fluorine based on the total weight of the coating being 100 weight-%.

15. The coated substrate of any one of embodiments 1 to 14, wherein the monolayer binding capacity (PBET) is in the range of from 0.3 to 1 .3 pmol/cm ² , preferably in the range of from 0.4 to 1.1 pmol/cm ² , more preferably in the range of from 0.5 to 0.8 pmol/cm ² , determined for toluene vapor by Inverse Gas Chromatography (iGC) according to Reference Example 5. The coated substrate of any one of embodiments 1 to 15, wherein the retention time (tp.end) for toluene vapor is in the range 30 to 250 minutes, more preferably in the range of from 35 to 200 minutes, more preferably in the range of from 40 to 175 minutes, determined by Inverse Gas Chromatography (IGC) according to Reference Example 5. The coated substrate of any one of embodiments 1 to 16, wherein the BET constant (CBET) is in the range of from 50 to 300, preferably in the range of from 50 to 200, more preferably in the range of from 70 to 175, determined for toluene vapor by Inverse Gas Chromatography (iGC) according to Reference Example 5. The coated substrate of any one of embodiments 1 to 17, wherein the static contact angle against water for a fluorine-free compound being a lactam with 4 to 8 ring atoms, a lactone with 4 to 8 ring atoms, vinylacetate, or polyvinylpyrrolidone is in the range of from 10 to 46° determined according to Reference Example 2, whereas the static contact angle for a C5 to C8 alkyne against water is in the range of from 90 to 120° determined according to Reference Example 2, and/or the static contact angle against diiodomethane is in the range of from 10 to 40° or a fluorine-free compound being a lactam with 4 to 8 ring atoms, a lactone with 4 to 8 ring atoms, vinylacetate, or polyvinylpyrrolidone determined according to Reference Example 2, whereas the static contact angle for a C5 to C8 alkyne against diiodomethane is in the range of from 40 to 55° determined according to Reference Example 2, and/or the static contact angle against formamide for a fluorine-free compound being a lactam with 4 to 8 ring atoms, a lactone with 4 to 8 ring atoms, vinylacetate, or polyvinylpyrrolidone is in the range of from 8 to 15° determined according to Reference Example 2, whereas the static contact angle for a C5 to C8 alkyne against formamide is in the range of from 70 to 80° determined according to Reference Example 2. The coated substrate of any one of embodiments 1 to 18, wherein the surface free energy derived according to Reference Example 2 from static contact angles of water, formamide and diiodomethane is in the range of from 48 to 73 mN/m for a fluorine-free compound being a lactam with 4 to 8 ring atoms, a lactone with 4 to 8 ring atoms, vinylacetate, or polyvinylpyrrolidone, whereas the surface free energy derived according to Reference Example 2 from static contact angles of water, formamide and diiodomethane for a C5 to C8 alkyne is in the range of from 30 to 40 mN/m . The coated substrate of any one of embodiments 1 to 19, wherein the coating has a thickness in the range of from 20 to 500 nm, preferably in the range of from 50 to 350 nm, preferably determined by transmission electron microscopy (TEM) according to Reference Example 6. 21 . The coated substrate of any one of embodiments 1 to 20, wherein the coating comprising the reaction product of the fluorine-free compound is present on at least parts of the substrate’s surface, preferably with a surface coverage determined by X-ray photoelectron spectroscopy (XPS) according to Reference Example 3 of at least 10 %, more preferred at least 20 %, more preferred at least 25 %, more preferred at least 30 %, of the area of the substrate’s surface, which has been treated with the plasma-assisted deposition method.

22. The coated substrate of any one of embodiments 1 to 21 , wherein the reaction product of the fluorine-free compound comprised in the coating is a radical polymerization product (in contrast to polycondensation) as determined by Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) according to Reference Example 4 as characterized by a shift of the nominal masses of the secondary ions by 2 amu that are created from such surface in comparison to the nominal masses of fragments that are created from the measurement of a polymer created by polycondensation.

23. The coated substrate of any one of embodiments 1 to 22, wherein a layer comprising a reaction product of acetylene is present between the substrate’s surface and the coating comprising a reaction product of the fluorine-free compound.

24. The coated substrate of embodiment 23, wherein the layer comprising a reaction product of acetylene is obtained or obtainable from a plasma-assisted deposition of acetylene.

25. The coated substrate of any one of embodiments 1 to 24, wherein the substrate comprises a material selected from the group consisting of organic material and mixtures of organic material and inorganic material, wherein the organic material is preferably one or more organic polymer(s) and the inorganic material is preferably selected from the group consisting of glass, silica, ceramics and steel.

26. The coated substrate of any one of embodiments 1 to 25, wherein the substrate comprises an organic polymer selected from the group consisting of polyolefin, preferably polyethylene (PE) or polypropylene (PP); polyamide (PA); polyurethane (PU); fluorinated polymer; silicone; polycarbonate (PC); polymethylmethacrylate (PM MA); polyacrylate; polyesters, especially polyethylene terephthalate (PET); cellulose; cellulose-derived polymers like cellulose acetate, lignin, lignin-based composites including wood; and mixtures of two or more of these organic polymers.

27. The coated substrate of any one of embodiments 1 to 26, wherein the substrate comprises an organic polymer selected from the group consisting of polyolefin, polyamide, polyester, and mixtures of two or more thereof, more preferred the substrate comprises an organic polymer selected from the group consisting of polyethylene, polyamide and mixtures of polyethylene and polyamide, more preferred the substrate comprises at least polyethylene (PE), more preferred high-density polyethylene (HDPE), more preferred at least 80 weight-%, more preferred at least 90 weight-%, more preferred at least 95 weight- %, more preferred at least 98 weight-% of the substrate consists of HDPE. The coated substrate of any one of embodiments 1 to 27, wherein the substrate is a packaging suitable for storing and transporting a good selected from the group consisting of food, beverage and chemical, wherein the chemical is preferably a hazardous substance (transported as dangerous good) or an agrochemical, wherein the coating is present on at least a surface of the substrate that faces or is intended for facing the good, wherein the good is more preferably an agrochemical, and the substrate is more preferably an (agro)chemical container, wherein the coating is present on at least a surface of the substrate that faces or is intended for facing the (agro)chemical The coated substrate of any one of embodiments 1 to 28, which is an agrochemical container. The coated substrate of any one of embodiments 1 to 29, wherein in the plasma-assisted deposition method, the plasma is generated in (a) at a pressure in the range from 0.5 to 1.5 bar, preferably in the range from 0.8 to 1.2 bar (atmospheric or near-atmospheric conditions, indirect atmospheric pressure plasma processing). The coated substrate of any one of embodiment 30, wherein the plasma-assisted deposition method comprises

(a) providing a substrate having a surface;

(b) generating a plasma under plasma-generating conditions by passing a carrier gas through an excitation zone and by applying high-frequency alternating current to an electrode positioned in the excitation zone to produce a dielectric barrier discharge thereby generating a plasma;

(c) generating an aerosol comprising a fluorine-free compound as defined in any one of embodiments 1 to 11 by using an atomizer gas;

(d) treating at least a part of the substrate surface provided according to (a) with the plasma generated according to (b) and the aerosol comprising the fluorine-free compound generated according to (c), thereby depositing a reaction product of the fluorine-free compound on the treated part of the substrate surface thereby obtaining a coated substrate. The coated substrate of embodiment 30 or 31 , wherein step (c) of the plasma-assisted deposition method comprises

(c.1) providing the fluorine-free compound in liquid form in a vessel having an outlet;

(c.2) passing an atomizer gas through a nozzle so that the atomizer gas gets in contact with the fluorine-free compound at the outlet of the vessel, thereby generating an aerosol comprising the fluorine-free compound. The coated substrate of any one of embodiments 1 to 29, wherein in the plasma-assisted deposition method, the plasma is generated at a pressure of <0.1 mbar, preferably in the range from 0.0001 to 0.09 mbar, preferably in the range from 0.001 to 0.05 mbar (low pressure plasma). 34. The coated substrate of embodiment 33, wherein the plasma-assisted deposition method comprises

(a) providing a substrate having a surface;

(b’) generating an aerosol comprising a fluorine-free compound as defined in any one of embodiments 1 to 11 , preferably by using an atomizer gas;

(c’) transforming the precursor aerosol generated in (b’) into a plasma state by a combination of excitations comprising a main excitation by means of microwavetype electromagnetic waves, and a secondary excitation by means of an electric discharge of alternating voltage having a frequency between 1 kHz and 15 MHz, thereby generating a plasma;

(d’) treating at least a part of the substrate surface provided according to (a) with the plasma generated according to (c’), thereby depositing a reaction product of the fluorine-free compound on the treated part of the substrate surface thereby obtaining a coated substrate.

35. The coated substrate of embodiment 34, wherein step (c.1 ) of the plasma-assisted deposition method comprises

(c’.a) providing the fluorine-free compound in liquid form, optionally with application of heating, in a vessel having an outlet;

(c’.b) passing an atomizer gas through a nozzle so that the atomizer gas gets in contact with the fluorine-free compound at the outlet of the vessel, thereby generating an aerosol comprising the fluorine-free compound.

36. The coated substrate of embodiment 33, wherein the plasma-assisted deposition method comprises

(a) providing a substrate having a surface;

(b”) providing an atmosphere comprising a fluorine-free compound in gaseous form or aerosol form, optionally under application of heating;

(c”) generating a plasma from the atmosphere comprising the fluorine-free compound according to (b”) under plasma-generating conditions a combination of excitations comprising a main excitation by means of microwave-type electromagnetic waves, and a secondary excitation by means of an electric discharge of alternating voltage having a frequency between 1 kHz and 15 MHz, thereby generating a plasma;

(d”) treating at least a part of the substrate surface provided according to (a) with the plasma generated according to (c”), thereby depositing a reaction product of the fluorine-free compound on the treated part of the substrate surface thereby obtaining a coated substrate.

37. The coated substrate of any one of embodiments 33 to 36, wherein the fluorine-free compound is preferably selected from the group consisting of a lactam with 4 to 8 ring atoms, a lactone with 4 to 8, preferably 6 to 8, ring atoms, vinylacetate, polyvinylpyrrolidone, and mixtures of two or more of these compounds, more preferably from the group consisting of lactam with 4 to 8 ring atoms excluding caprolactam, a lactone with 4 to 8, preferably 6 to 8, ring atoms, vinylacetate, polyvinylpyrrolidone, and mixtures of two or more of these compounds, more preferably from the group consisting of lactam with 4 to 8 ring atoms excluding caprolactam and excluding vinylpyrrolidone, a lactone with 4 to 8, preferably 6 to 8, ring atoms, vinylacetate, polyvinylpyrrolidone, and mixtures of two or more of these compounds, more preferably from the group consisting of a lactone with 4 to 8, preferably 6 to 8, ring atoms, vinylacetate, polyvinylpyrrolidone, and mixtures of two or more of these compounds, more preferably from the group consisting of a lactone with 4 to 8 ring atoms, vinylacetate, and mixtures of two or more of these compounds, more preferably the fluorine-free compound is a lactone with 4 to 8, preferably 6 to 8, ring atoms.

38. The coated substrate of any one of embodiments 30 to 32, wherein in the plasma-assisted deposition method, the plasma according to (a) is generated with a power per electrode area of less than 40 kW/m ² , preferably with a power in the range from 7.5 to 38 kW/m ² , more preferred in the range from 8 to 30 kW/m ² .

39. The coated substrate of any one of embodiments 30 to 32 and 38, wherein in the plasma- assisted deposition method, one or more atomizers, preferably at least two atomizers are used, wherein the atomizer gas according to (c) or (c.2) is provided into the second zone with a flow per atomizer of more than 0.5 slm (standard liter per minute), preferably with a flow per atomizer in the range from 0.5 to 5 slm, more preferred in the range from 0.8 to 3 slm, more preferred in the range from 1 to 2 slm.

40. The coated substrate of any one of embodiments 30 to 32 and 38 to 39, wherein in the plasma-assisted deposition method, the amount of the fluorine-free compound transported as aerosol to and into the plasma per time is in the range from 0.045 to 0.5 g/min per atomizer, preferably in the range from 0.045 to 0.3 g/min per atomizer, more preferred in the range from 0.05 to 0.2 g/min per atomizer, more preferred in the range from 0.08 to 0.12 g/min per atomizer.

41 . The coated substrate of any one of embodiments 30 to 32 and 38 to 40, wherein in the plasma-assisted deposition method, the outlet of the excitation zone is in a distance from the substrate surface according to (a) in the range from 0.5 to 10 mm, preferably in the range from 0.5 to 5 mm, more preferred in the range from 2 to 4 mm, more preferred in the range from 2.5 to 3.5 mm.

42. The coated substrate of any one of embodiments 30 to 32 and 38 to 41 , wherein in the plasma-assisted deposition method, the carrier gas is provided to the excitation zone with a flow in the range from 50 to 500 l/min, preferably in the range from 150 to 450 l/min, more preferred in the range from 200 to 300 l/min. 43. The coated substrate of any one of embodiments 30 to 32 and 38 to 42, wherein in the plasma-assisted deposition method, alternating voltages up to 100 kV are applied, wherein the alternating voltage is preferably in the range of 10 to 40 kV.

44. The coated substrate of any one of embodiments 30 to 32 and 38 to 43, wherein in the plasma-assisted deposition method, the discharge frequency is in the range from 50 to 100 kHz, preferably in the range from 60 to 100 kHz, more preferred in the range from 70 to 95 kHz, more preferred in the range from 80 to 90 kHz.

45. The coated substrate of any one of embodiments 30 to 32 and 38 to 44, wherein the plasma-assisted deposition method is carried out for a total time in the range of from 30 seconds to 10 minutes, preferably in the range of from 1 to 2 minutes.

46. The coated substrate of any one of embodiments 33 to 37, wherein the power density of electromagnetic waves is in the range of from 0.01 to 1 W/cm ³ and/or the power of the electric discharge is in the range of from 4 to 30 W and the frequency is in the range of from 20 to 200 kHz.

47. The coated substrate of any one of embodiments 30 to 46 wherein the plasma-assisted deposition method is carried out at a temperature in the range of from 10 to 80 °C.

48. The coated substrate of any one of embodiments 30 to 47, wherein in the plasma-assisted deposition method, preferably in none of steps (a), (b), (c), (d), more preferably at least not in step (d), water is added and/or wherein the plasma-assisted deposition method, preferably at least step (d) thereof, is carried out in an atmosphere containing at the outmost as much water as contained in the atmosphere based on a relative humidity (RH) of 100 % at the respective process temperature.

49. A plasma-assisted deposition method for applying a coating onto a surface of a substrate comprising:

(a) providing a substrate having a surface;

(b) generating a plasma under plasma-generating conditions by passing a carrier gas through an excitation zone and by applying high-frequency alternating current to an electrode positioned in the excitation zone to produce a dielectric barrier discharge thereby generating a plasma;

(c) generating an aerosol comprising a fluorine-free compound as defined in any one of embodiments 1 to 11 , preferably by using an atomizer gas; d) treating at least a part of the substrate surface provided according to (a) with the plasma generated according to (b) and the aerosol comprising the fluorine-free compound generated according to (c), thereby depositing a reaction product of the fluorine-free compound on the treated part of the substrate surface thereby obtaining a coated substrate. 50. The plasma-assisted deposition method for applying a coating onto a surface of a substrate according to embodiment 49, wherein step (c) of the plasma-assisted deposition method comprises

(c.1) providing the fluorine-free compound in liquid form in a vessel having an outlet;

(c.2) passing an atomizer gas through a nozzle so that the atomizer gas gets in contact with the fluorine-free compound at the outlet of the vessel, thereby generating an aerosol comprising the fluorine-free compound.

51 . The plasma-assisted deposition method for applying a coating onto a surface of a substrate according to embodiment 49 or 50, wherein the plasma is generated in (a) at a pressure in the range from 0.5 to 1.5 bar, preferably in the range from 0.8 to 1.2 bar (atmospheric or near-atmospheric conditions, indirect atmospheric pressure plasma processing).

52. The plasma-assisted deposition method for applying a coating onto a surface of a substrate according to any one of embodiments 49 to 51 , wherein the plasma according to (a) is generated with a power per electrode area of less than 40 kW/m ² , preferably with a power in the range from 7.5 to 38 kW/m ² , more preferred in the range from 8 to 30 kW/m ² .

53. The plasma-assisted deposition method for applying a coating onto a surface of a substrate according to any one of embodiments 49 to 52, wherein one or more atomizers, preferably at least two atomizers are used, wherein the atomizer gas according to (c) or (c.2) is provided into the second zone with a flow per atomizer of more than 0.5 slm (standard liter per minute), preferably with a flow per atomizer in the range from 0.5 to 5 slm, more preferred in the range from 0.8 to 3 slm, more preferred in the range from 1 to 2 slm.

54 The plasma-assisted deposition method for applying a coating onto a surface of a substrate according to any one of embodiments 49 to 53, wherein the amount of the fluorine-free compound transported as aerosol to and into the plasma per time is in the range from 0.045 to 0.5 g/min per atomizer, preferably in the range from 0.045 to 0.3 g/min per atomizer, more preferred in the range from 0.05 to 0.2 g/min per atomizer, more preferred in the range from 0.08 to 0.12 g/min per atomizer.

55. The plasma-assisted deposition method for applying a coating onto a surface of a substrate according to any one of embodiments 49 to 54, wherein the outlet of the excitation zone is in a distance from the substrate surface according to (a) in the range from 0.5 to 10 mm, preferably in the range from 0.5 to 5 mm, more preferred in the range from 2 to 4 mm, more preferred in the range from 2.5 to 3.5 mm.

56. The plasma-assisted deposition method for applying a coating onto a surface of a substrate according to any one of embodiments 49 to 55, wherein the carrier gas is provided to the excitation zone with a flow in the range from 50 to 500 l/min, preferably in the range from 150 to 450 l/min, more preferred in the range from 200 to 300 l/min. The plasma-assisted deposition method for applying a coating onto a surface of a substrate according to any one of embodiments 49 to 56, wherein alternating voltages up to 100 kV are applied, wherein the alternating voltage is preferably in the range of 10 to 40 kV. The plasma-assisted deposition method for applying a coating onto a surface of a substrate according to any one of embodiments 49 to 57, wherein the discharge frequency is in the range from 50 to 100 kHz, preferably in the range from 60 to 100 kHz, more preferred in the range from 70 to 95 kHz, more preferred in the range from 80 to 90 kHz. The plasma-assisted deposition method for applying a coating onto a surface of a substrate according to any one of embodiments 49 to 58, wherein the plasma-assisted deposition method is carried out at a temperature in the range of from 10 to 80 °C. The plasma-assisted deposition method for applying a coating onto a surface of a substrate according to any one of embodiments 49 to 59, wherein the plasma-assisted deposition method is carried out for a total time in the range of from 30 seconds to 10 minutes, preferably in the range of from 1 to 2 minutes. A plasma-assisted deposition method for applying a coating onto a surface of a substrate, wherein the plasma is generated at a pressure of <0.1 mbar, preferably in the range from 0.0001 to 0.09 mbar, preferably in the range from 0.001 to 0.05 mbar (low pressure plasma). The plasma-assisted deposition method for applying a coating onto a surface of a substrate according to embodiment 61 , wherein the plasma-assisted deposition method comprises

(a) providing a substrate having a surface;

(b’) generating an aerosol comprising a fluorine-free compound as defined in any one of embodiments 1 to 11 by using an atomizer gas;

(c’) transforming the precursor aerosol generated in (b’) into a plasma state by a combination of excitations comprising a main excitation by means of microwavetype electromagnetic waves, and a secondary excitation by means of an electric discharge of alternating voltage having a frequency between 1 kHz and 15 MHz, thereby generating a plasma;

(d’) treating at least a part of the substrate surface provided according to (a) with the plasma generated according to (c’), thereby depositing a reaction product of the fluorine-free compound on the treated part of the substrate surface thereby obtaining a coated substrate. 63. The plasma-assisted deposition method for applying a coating onto a surface of a substrate according to embodiment 62, wherein step (c) of the plasma-assisted deposition method comprises

(c’.a) providing the fluorine-free compound in liquid form, optionally with application of heating, in a vessel having an outlet;

(c’.b) passing an atomizer gas through a nozzle so that the atomizer gas gets in contact with the fluorine-free compound at the outlet of the vessel, thereby generating an aerosol comprising the fluorine-free compound.

64. A plasma-assisted deposition method for applying a coating onto a surface of a substrate, wherein the plasma-assisted deposition method comprises

(a) providing a substrate having a surface;

(b”) providing an atmosphere comprising a fluorine-free compound as defined in any one of embodiments 1 to 11 in gaseous form or aerosol form, optionally under application of heating;

(c”) generating a plasma from the atmosphere comprising the fluorine-free compound according to (b”) under plasma-generating conditions by combination of excitations comprising a main excitation by means of microwave-type electromagnetic waves, and a secondary excitation by means of an electric discharge of alternating voltage having a frequency between 1 kHz and 15 MHz, thereby generating a plasma;

(d”) treating at least a part of the substrate surface provided according to (a) with the plasma generated according to (c”), thereby depositing a reaction product of the fluorine-free compound on the treated part of the substrate surface thereby obtaining a coated substrate.

65. The plasma-assisted deposition method for applying a coating onto a surface of a substrate of any one of embodiments 49 or 50 or 61 to 64, wherein the fluorine-free compound is preferably selected from the group consisting of a lactam with 4 to 8 ring atoms, a lactone with 4 to 8, preferably 6 to 8, ring atoms, vinylacetate, polyvinylpyrrolidone, and mixtures of two or more of these compounds, more preferably from the group consisting of lactam with 4 to 8 ring atoms excluding caprolactam, a lactone with 4 to 8, preferably 6 to 8 ring atoms, vinylacetate, polyvinylpyrrolidone, and mixtures of two or more of these compounds, more preferably from the group consisting of lactam with 4 to 8 ring atoms excluding caprolactam and excluding vinylpyrrolidone, a lactone with 4 to 8, preferably 6 to 8, ring atoms, vinylacetate, polyvinylpyrrolidone, and mixtures of two or more of these compounds, more preferably from the group consisting of a lactone with 4 to 8, preferably 6 to 8, ring atoms, vinylacetate, polyvinylpyrrolidone, and mixtures of two or more of these compounds, more preferably from the group consisting of a lactone with 4 to 8 ring atoms, vinylacetate, and mixtures of two or more of these compounds, more preferably the fluorine-free compound is a lactone with 4 to 8, preferably 6 to 8, ring atoms. 66. The plasma-assisted deposition method for applying a coating onto a surface of a substrate of any one of embodiments 61 to 65, wherein the power density of electromagnetic waves is in the range of from 0.01 to 1 W/cm ³ and/or the power of the electric discharge is in the range of from 4 to 30 W and the frequency is in the range of from 20 to 200 kHz.

67. The plasma-assisted deposition method for applying a coating onto a surface of a substrate of any one of embodiments 49 to 66, wherein in the plasma-assisted deposition method, preferably in none of steps (a), (b), (c), (d), more preferably at least not in step (d), water is added and/or wherein the plasma-assisted deposition method, preferably at least step (d) thereof, is carried out in an atmosphere containing at the outmost as much water as contained in the atmosphere based on a relative humidity (RH) of 100 % at the respective process temperature.

68. The plasma-assisted deposition method for applying a coating onto a surface of a substrate of any one of embodiments 49 to 67, wherein the substrate comprises an organic polymer selected from the group consisting of polyolefin, preferably polyethylene (PE) or polypropylene (PP); polyamide (PA); polyurethane (PU); fluorinated polymer; silicone; polycarbonate (PC); polymethylmethacrylate (PMMA); polyacrylate; polyesters, especially polyethylene terephthalate (PET); cellulose; cellulose-derived polymers like cellulose acetate, lignin, lignin-based composites including wood; and mixtures of two or more of these organic polymers.

69. The plasma-assisted deposition method for applying a coating onto a surface of a substrate of any one of embodiments 49 to 68, wherein the substrate comprises an organic polymer selected from the group consisting of polyolefin, polyamide, polyester, and mixtures of two or more thereof, more preferred the substrate comprises an organic polymer selected from the group consisting of polyethylene, polyamide and mixtures of polyethylene and polyamide, more preferred the substrate comprises at least polyethylene (PE), more preferred high-density polyethylene (HDPE).

70. Use of a coated substrate according to any one of embodiments 1 to 48 or of a coated substrate obtained or obtainable from the plasma-assisted deposition method of any one of embodiments 49 to 69, for packaging, storing and/or transporting a good selected from the group consisting of food, beverage and chemical wherein the good is preferably a chemical, wherein the chemical is preferably a hazardous substance (transported as dangerous good) or an agrochemical, more preferably an agrochemical.

The present invention is further illustrated by the following reference examples, and examples.

Examples

Reference Example 1 : Plasma coating method at atmospheric pressure Cast high-density polyethylene (HDPE) plates (cleaned by rinsing with isopropanol and blow- drying in air) with a size of 20 cm x 25 cm were pretreated in a Plasmal_ine200® reactor (product of VITO) in a first coating step with a plasma generated using argon carrier gas at a flow of 250 slm, into which pure acetylene gas was fed at a flow of 2 x 2.5 slm (i.e. a feed of 2.5 slm per atomizer since the PlasmaLine200® reactor comprises two gas inlets linked to two atomizers). This gaseous mixture was fed into the afterglow region of the plasma, through which the HDPE plate was moved at a speed of 2 m/min for 30 times (hereinafter referred to as number of passes) and was thus coated with reaction products of acetylene. During this first coating step, the frequency of the DC current driving the plasma was set to 85 kHz, using a power of 150 W. The distance between the outlet of the excitation zone to the substrate surface was kept constant at 3 mm. The resulting HDPE plate had a coating with reaction products of acetylene on its surface and was called a “pretreated substrate”. In a second coating step, a reaction product of epsilon-caprolactam was deposited on the pretreated substrate obtained from the first coating step. For this purpose, the pretreated substrate was exposed to another plasma generated using argon carrier gas at a flow of 250 slm, into which a epsilon-caprolactam was fed in the form of an aerosol obtained by vaporizing a 1000 g/L solution of the precursor in methanol with Ar gas in two atomizers at a flow of 1 .5 slm per atomizer. The pretreated substrate was passed through the afterglow region for 30 times at a speed of 2 m/min and was thus coated with reaction products of the fluorine-free compound. During this second coating step, the frequency of the DC current driving the plasma was set to 85 kHz, using a power of 150 W. Based on the known surface area of the used high-voltage electrodes (100 cm ² ), the power density applied in this coating process was 15 kW/m ² or 1 .5 W/cm ² . The distance between the outlet of the excitation zone to the substrate surface was kept constant at 3 mm. A substrate having deposited on its surface reaction products of acetylene and thereon reaction products of epsilon-caprolactam was thus obtained by a plasma-assisted coating process at atmospheric pressure.

Reference Example 2: Plasma coating method at low pressure

Standard 1 L bottles consisting of HDPE were introduced into a low-pressure plasma reactor developed and described by ISYTECH (US 2022/112595 A1 ). The reactor comprised a vacuum chamber placed in a microwave coupler. The pressure inside the bottle and in the vacuum chamber surrounding the bottle was reduced to <0.1 mbar and 20 mbar, respectively, by using vacuum pumps. Subsequently, the interior surface of the HDPE bottle was treated for a period of 5 s with an argon plasma, which was generated by adding Ar gas at a flow rate of 120 seem (standard cubic centimeters) into the inner volume of the bottle and introducing the energy required for plasma ignition by a microwave generator at a frequency of 2.45 GHz and a power of 350 W. The resulting HDPE container was called a “precleaned bottle” and used for successive plasma-assisted coating at low pressure. In a first coating step, gaseous acetylene was fed at 100 seem into the inner volume of the precleaned bottle and activated into a plasma state by electromagnetic waves supplied by the microwave generator at a power of 400 W. This caused partial decomposition of the reaction gas and the deposition of reaction products of acetylene on the inner surface of the precleaned bottle for a period of 1 s, yielding a “pretreated bottle”. In a second step, gaseous 1 -octyne obtained from the headspace over liquid 1 -octyne was introduced into the inner volume of the pretreated bottle by argon carrier gas and activated into a plasma state by electromagnetic waves supplied by the microwave generator at a power of 500 W, which corresponds to an effective power density of 0.5 W/cm ³ . Treatment with the resulting plasma for a period of 3 s led to the deposition of reaction products of 1 -octyne on the inner surface of the pretreated bottle. A substrate having deposited on its surface reaction products of acetylene and thereon reaction products of 1 -octyne was thus obtained by a plasma-assisted coating process at low pressure.

Reference Example 3: Static contact angle measurements

The wetting behavior of coated substrates and untreated references (e.g. blank HDPE) was studied by means of regular contact angle measurements, using three standard solvents (water as highly polar liquid, diiodomethane as highly non-polar liquid, and formamide as liquid of intermediate polarity). 8-10 droplets (volume: 0.5-2 pl) of these liquids were deposited on the substrates and the contact angle was measured after 10 s by shape analysis (sessile drop method, fitting the drop contour by means of ellipsoids or circles) using a Kriiss DSA100 instrument at ambient conditions (23°C). The resulting contact angles were averaged and are quoted as mean values with corresponding standard deviation. In addition, the contact angles obtained for water, formamide and diiodomethane were used to calculate the surface energy (with polar and dispersive components) of the substrate based on the theory of Owens and Wendt (D. Owens & R. Wendt, J. AppL Polym. Sci. 1969, vol. 13, pp. 1741 ).

Reference Example 4: X-ray photoelectron spectroscopy (XPS) analyses

XPS analyses were carried out with a Kratos Axis Nova XPS-Spectrometer using monochromatic Al Ka radiation (120 W) with a spot size of 800 pm x 300 pm in standard configuration. The XPS system was calibrated according to ISO 15472.2001 . The binding energy of Au 4f7/2 is 84.00 eV and that of Cu2p3/2 is 932.62 eV. All samples were mounted insulated against ground and neutralized during the measurements with a built-in charge neutralizer. Survey scan analyses were carried out with a pass energy of 160 eV and an energy step size of 0.5 eV. High-resolution analyses were carried out on the same analysis area with a pass energy of 40 eV and an energy step size of 0.1 eV. Spectra were charge-corrected to the main line of the carbon 1s spectrum set to 284.8 eV as a typical value quoted for the energy of the peak of adventitious hydrocarbon. All spectra were analyzed using standard XPS analysis software like CasaXPS (version 2.3.20) and applying Shirley background subtraction of the main peaks for the elements of interest (F1s, N1s, O1s, C 1s, Si 2p). Relative sensitivity factors and transmission function as provided by the instrument manufacturer were used for quantification.

Based on the type of substrate and precursor used, the surface coverage was calculated in three different ways from the collected XPS spectra: (i) In cases where the substrate contained elements in significant concentrations that were not present in the precursor, surface coverage after plasma-assisted coating could be estimated by the following formula:

Coverage (in percent) =100*(1 -C _S ampie/C _re f) Equation (XPS I) where Csampie is the atomic concentration of the element specific to the substrate in at-% after the plasma treatment and C _re f is the atomic concentration of the element specific to the substrate in at-% on the untreated clean reference. Hence a sample with the same concentration of the specific substrate element would result in zero percent coverage, while a sample with no detectable specific substrate element would result in 100 % coverage.

(ii) In cases where the precursor contained elements in significant concentrations that were not present on the substrate, surface coverage could be estimated based on the theoretical composition of the precursor used in the process, if there was conclusive experimental evidence that the precursor was deposited in this defined molecular form. Here, surface coverage after plasma-assisted coating could be calculated as:

Coverage (in percent) =100*(C _S ampie C _t heor) Equation (XPS II) where Csampie is the atomic concentration of the element specific to the coating in at-% after the plasma treatment and Ctheor is the atomic concentration of the element specific to the precursor in at-% calculated based on the stoichiometry of the precursor. Hence a sample with the same concentration of the element as in the theoretical composition would result in 100 % coverage, while a sample with no detectable specific precursor element would result in zero percent coverage.

(iii) In cases where the substrate contained elements that were also present in the precursor but existed in a different binding state and hence exhibited a different chemical shift in the XPS spectra, the coverage could be derived by using the relative fractions of the concerned elements in the binding states specific to the precursor as obtained from peak fitting procedures.

Coverage (in percent) =100*(C _S ampie/Ct _heO r.precuraor) Equation (XPS III)

For samples obtained by plasma-assisted coating of HDPE with reaction products of fluorine-free compounds, the surface coverages were calculated according to equation (XPS II) or equation (XPS III), while equation (XPS II) was used to calculate the coverage for the comparative sample obtained by plasma-assisted deposition of reaction products of tetramethylsilane (Comp2 in Table 2). Here and in the following, comparative samples are abbreviated as CompX, wherein “X” is here a placeholder for the respective number of the comparative sample. For analyses according to equation (XPS III), the carbon 1s spectra of the coated substrates were fitted with components representing carbon atoms bound to either nitrogen or oxygen in the various possible forms as present on the substrate and, accordingly, in the precursor (e.g. COOR for vinylacetate, C-N in C(=O)-N- for lactams, and C-N, C-0 for lactams, lactones and vinylacetate). The parameters used for this type of evaluation are shown in Table 1. Table 1

Parameters used for evaluation of XPS spectra and calculation of surface coverages in the case of lactams, lactones and vinylacetate precursors (Samples 2-10).

For the estimation of surface coverages of comparative samples carrying fluorine-rich surface coatings (Comp3 and Comp4), the carbon 1s spectra of the coated substrates were fitted with components representing carbon atoms bound to fluorine in different stoichiometries (i.e. CF3, CF ₂ , CHF) and fluorine-free functional groups (like CH ₂ ) as present in the HDPE substrate. The parameters used for this type of evaluation are shown in Table 2.

Table 2

Parameters used for evaluation of XPS spectra and calculation of surface coverages for fluorinated HDPE surfaces (Comp3, Comp4).

The coverage was then calculated via the following equation: Equation (XPS IV) where Ren is the percentage of the binding state of interest in the detail spectrum of the carbon 1s signal for carbon atoms bound to 1 , 2, or 3 fluorine atoms, respectively, and C _F and C _c represent the total concentration (in atom-%) of fluorine and carbon, respectively, on the surface as derived from the survey spectrum.

In the case of alkynes such as 1 -octyne, no determination via XPS was possible due to the lack of chemical difference compared to the HDPE substrate. Here, the presence of reaction products of the precursor on the substrate after plasma-assisted deposition could be independently verified by TEM imaging (as described in Reference Example 7) as well as atomic force microscopy (as described in Reference Example 8). Finally, the surface coverage of the comparative samples consisting of coextruded HDPE and polyamide (Comp5), i.e. the amount of PA at the surface, could not be determined reliably by XPS due to the presence of strongly adhering surface contaminations.

Reference Example 5: Time-of-flight secondary ion mass spectrometry (ToF-SIMS) analyses

Static ToF-SIMS spectra were recorded using a ToF.SIMS 5 spectrometer (lonTOF GmbH, Munster Germany). A pulsed mass-filtered primary ion beam of 50 keV singly charged triple bismuth clusters (Bi ₃ ²⁺ ) was used to record spectra of secondary electrons over an area of 500 pm x 500 pm in positive ion detection mode. To prevent charging of the sample surface, a low-electron energy flood gun (~20 eV) was used. Mass resolution was limited by the roughness of the surfaces to a range of M/AM-1000 at 55 u and was improved by the use of the “Advanced ToF-Correction” as provided by SurfaceLab 7.2 after mass calibration by using the hydrocarbon peaks CHs ⁺ (15 u), C ₂ H3 ⁺ (27 u), C3H ₅ ⁺ (41 u), C3H (43 u) and C ₄ H ₇ ⁺ (55 u). The resulting spectra were compared to reference spectra of polymers synthesized by polycondensation.

Reference Example 6: Inverse gas chromatography (IGO)

The barrier effect of coated substrates and untreated references (e.g. blank HDPE) against organic solvents was assessed by means of inverse gas chromatography (iGC) (see Chapter “Surface Properties Characterization by Inverse Gas Chromatography (IGC) Applications”, by Eric Brendle, Eugene Papirer Book “Powders and Fibers”, 1st Edition, 2006, ImprintCRC Press, page 76), using toluene vapor as test permeant. For this purpose, the substrates were cut into stripes of 14 cm in length and 1 cm in width and mounted into a sample cell as shown in Figure 1. The cell consisted of two 14 cm x 14 cm aluminium plates. On the bottom surface of the upper plate, a linear notch of 12.8 cm in length, 1 mm in width and 0.25 mm in depth was imprinted as chromatographic path (see Figure 1 a). At both ends of the notch, 1/16” bores were drilled to allow for gas inlet and outlet. The sample stripe was placed along the notch (as shown in Figure 1b) and sandwiched between the upper and lower plates, which were then connected firmly by several screws to ensure gas tightness (see Figure 1 c). Suitable Swagelok connectors and PEEK fittings were used to link the outer ends of the inlet and outlet bores on the top of the upper plate with PEEK capillaries (1/16”, 10 cm long), through which the entire assembly was connected to the chromatograph. iGC experiments were performed on a Thermo Fisher Tracel 310 gas chromatograph equipped with flame-ionization detectors (Fl Ds) and a PAL3 RSI injection system. The system was operated with Neuronics 2.2.3 und InPulse 2.3.5 software provided by Adscientis SARL. After assembly of the sample cell and connection to the GC instrument, the cell was placed in the oven of the GC and conditioned at 40 °C for 4 hours in dry helium (Nippon Gases, 6.0 quality) at a flow rate of 18 ml/min, in order to remove any volatile contaminants from the surface of the coated substrate. Subsequently, liquid toluene (Honeywell, p.a. quality) was injected at a constant rate of 0.02 pl/s for a period of ca. 9 minutes into the He carrier gas at a corrected carrier gas flow rate of 5.4 ml/min and a temperature of 40 °C. In this way, the surface of the coated substrate (or the uncoated references) in the chromatographic channel of the cell was exposed to constant relative toluene pressure of p/po = 0.64 (where po is the saturation pressure of toluene at 40 °C). After initial adsorption of toluene on the sample surface, a stable FID reading was established in the course of the injection period in all cases, indicating that the surfaces were saturated with toluene under the given experimental conditions. Subsequently, injection was stopped and the substrates were purged with pure He carrier gas, leading to progressive desorption of toluene. Acquisition was stopped once a FID signal of 10 pA (corresponding to a relative toluene pressure of p/po = 4.5-10 ⁵ ) was reached and the respective time (t _R , _en d, referred to the point in time when toluene injection was stopped and puring with pure He was started) was noted as a first parameter characterizing the barrier effect (with higher tp.end indicating weaker barrier and vice versa). From the resulting desorption profiles, adsorption isotherms were calculated in the form of q _a ds = f(p/po), where q _a ds is the adsorbed amount of toluene at any given p/po during desorption, according to procedures described in the literature (see Chapter “Surface Properties Characterization by Inverse Gas Chromatography (IGC) Applications”, by Eric Brendle, Eugene Papirer Book “Powders and Fibers”, 1st Edition, 2006, ImprintCRC Press, page 76). The obtained isotherms were then evaluated using the Brunauer-Emmett-Teller (BET) theory (see Brunauer, Stephen; Emmett, P. H.; Teller, Edward (1938). "Adsorption of Gases in Multimolecular Layers". Journal of the American Chemical Society. 60 (2): 309-319) for a relative pressure regime of 0.01 < p/po < 0.05, giving the monolayer binding capacity q _B ET as well as the corresponding BET constant CBET as additional two parameters to characterize the barrier effect (note that q _BB T describes the number of binding sites for toluene on the investigated surface and is expressed as molar amounts of adsorbed toluene molecules per unit of explored surface area in pmol/cm ² , whereas C _B ET indicates the strength of binding). Strong barrier against toluene vapor is reflected by low values for q _B ET and/or CBET.

Reference Example 7: Transmission electron microscopy (TEM) analyses

The thin fluorine-free layers present on the HDPE surface after the successful plasma- assisted coating process were visualized in cross-section by TEM imaging. For sample preparation, the plasma-treated surface was first coated with a layer of platinum (thickness: about 50 nm) and then embedded in an epoxy resin. Ultrathin cross-sections were prepared via cryoultramicrotomy using a Leica UC 7 microtome. The resulting thin sections of the samples were examined on a Zeiss Libra 120 microscope equipped with an omega filter and operating at an acceleration voltage of 120 kV in elastic and inelastic mode.

Reference Example 8: Determination of surface roughness by atomic force microscopy (AFM)

The surface roughness of coated substrates and uncoated references was characterized by means of AFM using a Dimension ICON instrument from Bruker under ambient conditions. Topographical height images were collected in tapping mode covering surface areas of 2 pm x 2 m, 5 pm x 5 pm and 50 pm x 50 pm. From the 2 pm x 2 pm images, the roughness values Ra and Rq were derived. Ra roughness is defined as the arithmetic average of the absolute values of the surface height deviations (Z) measured from the respective mean plane at each analyzed point in the image (i) with a total number N of analyzed points:

Rq represents the root mean square (RMS) surface roughness, calculated according to:

Reference Example 9: Mechanical characterization by nanoindentation

The mechanical properties of HDPE substrates and fluorine-free coatings applied to such substrates were investigated by means of nanoindentation experiments using a Nano Indenter G200 instrument from KLA, equipped with a DCM II head and a diamond tip with Berkovich geometry. In a first step, cross-sections of the samples were prepared by cryo-microtomy at -80 °C using a Leica EM UC 7 microtome and a DiATOME diamond knife. The microstructure and morphology of the obtained cross-sections was then examined by atomic force microscopy using a Dimension ICON instrument from Bruker under ambient conditions, in order to localize the outer coating and the bulk HDPE material beneath. Topographical height and phase contrast images were collected in tapping mode with 160AC-NA cantilevers across surface areas of 2 pm x 2 pm. Subsequently, the mechanical properties of the bulk HDPE substrate were determined by nanoindentation in quasi-static mode at a maximum load of 1 mN. In a second step, nanoindentation measurements were conducted on the surface of intact coated samples using the continuous stiffness mode (CSM, see L. Xiaodong et al., Materials Characterization, vo. 48, issue 1 , 02/2022, pages 11-36) with a maximum displacement into the surface of 500 nm. This method provides values for the elastic modulus and the hardness as a function of depth (i.e. distance from the coated surface into the bulk material).

Example 1 : Plasma treatment of H DRE plates at atmospheric pressure

Prior to plasma-assisted coating, all HDPE substrates were cleaned by rinsing with isopropanol and subsequent blow-drying. For each selected chemical precursor and set of process parameters, at least two HDPE plates were coated independently by plasma-enhanced chemical vapor deposition according to Reference Example 1 . Precursors were supplied either in pure liquid state or as solution in organic solvents. The chosen precursors with their respective coating conditions are summarized in Table 3. The following process parameters were the same for all samples listed in Table 3:

Type of carrier gas: Argon

Carrier gas flow rate: 250 l/min Type of atomizer gas: Argon

Frequency of DC current: 85 kHz

Distance from outlet of excitation zone to substrate: 3 mm

Speed of substrate motion through afterglow region: 2 m/min

Substrate: HDPE

In all cases, the HDPE plates were pretreated by plasma coating with acetylene as described in Reference Example 1.

For comparison, HDPE substrates were analyzed without coating (Compl) and after coating by plasma-enhanced chemical vapor deposition using tetramethylsilane (Comp2) as precursor compound, following the same process as in Reference Example 1 .

For further comparison, commercially available HDPE containers were purchased and analyzed in full analogy to the samples prepared by plasma-assisted deposition as described above. The following types of containers (all 5 I canisters, manufactured according to state-of-the-art processes established in the packaging industry and characterized on their respective interior surface) were included in the analyses: (I) HDPE coated by plasma treatment with the fluorine- containing precursor Freon R-134a (referred to as “Plasma-F”, Comp3, having a fluorine-rich layer of 50-60 nm in thickness on its interior surface, as determined by TEM analyses on crosssections), (ii) HDPE coated with F ₂ gas (referred to as “Direct-F”, Comp4, having a fluorine-rich layer of ca. 200 nm in thickness on its interior surface, as determined by TEM analyses on cross-sections), and (ill) HDPE coextruded with polyamide-6 (referred to as “PE/PA Coex”, Comp5, having a polyamide-rich layer of 50-60 pm in thickness on its interior surface, as determined by AFM analyses on cross-sections), (ii)

Table 3

Plasma process conditions used for the preparation of fluorine-free coatings on HDPE according to the present invention (Samples 1-10) at atmospheric pressure (Reference Example 1), with uncoated HDPE (Compl) and coatings based on silane (Comp2) as comparative samples (n/a: not applicable).

Example 2: Plasma treatment of H DPE bottles at low pressure

For plasma-assisted coating of H DPE substrates with fluorine-free precursors at low pressure, intact bottles made from HDPE with a nominal volume of 1 I were used. The interior surface of the bottles was treated in successive steps using low-pressure plasma generated by electromagnetic waves supplied by a microwave generator according to Reference Example 2. In the final coating step, either 1 -octyne or 1 -pentyne were applied as gaseous precursors as given in Table 4. For comparison, a 1 I HDPE bottle of the same type without any coating or plasma treatment was included as a reference for further analyses.

Table 4

Conditions used for the preparation of fluorine-free coatings on the interior surfaces of HDPE bottles according to the present invention (Samples 1-10) at low pressure (Reference Example 2), with an uncoated HDPE bottle (CompO) as comparative sample (n/a: not applicable).

Example 3: Surface coverage of HDPE substrates after plasma-assisted coating The samples prepared as described in Example 1 were analyzed with respect to their surface coverage by XPS according to Reference Example 4. The results are listed in Table 5. Surface coverages could not be determined by XPS for Sample 1 and Comp5, as explained in Reference Example 4.

Table 5

Surface coverages (average values) determined by means of XPS analysis according to Reference Example 4 for HDPE substrates before and after plasma-assisted coating at atmospheric pressure (n.p.: determination not possible by XPS; n/a: not applicable).

The data showed that nominal surface coverages of samples prepared according to the present invention varied over a broad range (17-92 %) as depending on the type of used precursor, even though the chosen process conditions for plasma-assisted deposition were similar. In turn, relatively high surface coverages (72-77 %) were obtained for fluorinated reference materials (i.e. Comp3, Comp4). Nevertheless, several of the inventive fluorine-free coatings could compete with these reference materials (and the PE/PA-COEX material, Comp5) in terms of barrier properties determined against toluene vapor, as described in Example 5, despite their low thickness. This indicated that a certain minimum coverage was required for strong barrier performance, but the particular threshold depended on the type of precursor used.

XPS analyses of the samples prepared by plasma-assisted coating with reaction products of 1- octyne (Sample 11) and 1 -pentyne (Sample 12) at low pressure (as described in Example 2) gave surface compositions very similar to octyne-based coatings formed by plasma-assisted deposition at atmospheric pressure (Sample 1). The C-1s spectra could be fitted by the same model and showed that the main portion of the carbon signal (ca. 75 %) came from CH2 chemical groups at 284.8 eV.

Example 4: ToF-SIMS characterization of polyamide obtained from plasma-assisted coating as compared to conventional polyamide-6 Coatings obtained via plasma-assisted deposition of epsilon-caprolactam (Sample 4, hereinafter referred to as “plasma-polyamide”) at atmospheric pressure as described in Example 1 were analyzed in comparison to a bulk polyamide-6 sample, wherein the PA-6 was made by classical condensation polymerization (Comp5). Analysis was done by ToF-SIMS according to Reference Example 5. The results are shown in Table 6, while the corresponding ToF-SIMS spectra (cation detection mode) in the range of 5-300 amu are shown in Fig. 2.

Table 6

Nominal masses of selected peaks detected by ToF-SIMS for plasma-polyamide in comparison to conventional polyamide-6.

The data in Table 6 showed that for polyamide-6 produced by conventional polycondensation, a monomer+H ⁺ ion was detected at 114 amu, whereas for coatings obtained from plasma- assisted deposition of reaction products of epsilon-caprolactam, fragments appeared at a nominal mass of 112. This indicated the formation of a polyamide material by hydrogen abstraction and subsequent radical polymerization. The same pattern was found for all other characteristic fragments and deviations between plasma-polyamide and conventional PA-6 become more pronounced with higher masses, due to the difference of one nominal mass unit per monomer in the two types of polymer.

Example 5: Weting behavior of HDPE substrates after plasma-assisted coating

The effect of the coating of HDPE substrates with reaction products of different precursors via plasma-assisted deposition at atmospheric pressure (prepared as described in Example 1 ) on the wetting behavior was assessed by static contact angle measurements using water, formamide and diiodomethane as test liquids. For comparison, several commercially available HDPE containers with different barrier technologies (Comp3, Comp4, Comp5) as well as uncoated HDPE material (Compl) were also analyzed.

The results are shown as bar plots in Fig. 3 and listed as average values (AVG) with corresponding standard deviations (SdDev) in Table 7.

Table 7 Static contact angles (average values with corresponding standard deviations) determined according to Reference Example 3 for water, formamide and diiodomethane on HDPE after plasma-assisted deposition of different precursors at atmospheric pressure according to the present invention (Samples) and selected comparative samples (CompX).

It was observed that plasma-assisted deposition of reaction products of fluorine-free polar compounds on HDPE substrates at atmospheric pressure according to the present invention (Samples 2-10) resulted in increased wettability (lower contact angles after coating) against all three test liquids used. Static contact angles measured against water were in the range of 10 to 66°, as compared to 97.1 ° for uncoated HDPE and 85-108° for Comp2 - Comp5. This indicated that coating with polar (i.e. more hydrophilic) fluorine-free precursors was successful. Similar trends of enhanced wettability were also observed for the unpolar test liquid diiodomethane (15- 42° for Samples 2-10 as compared to >45°for all Comparative Samples) and medium-polar formamide (8-36°for Samples 2-9 and 50.2°for Sample 10 due to the non-polar co-reactant, compared to 70-80° for Compl , Comp 2, Comp 3 and Comp 5, with Comp4 as exception). The only differing inventive example was Sample 1 , i.e. coatings obtained by plasma-assisted deposition of reaction products of 1 -octyne. However, this was reasonable as alkynes are nonpolar compounds in contrast to lactams, lactones and vinylacetate. In fact, the wetting behavior observed for Sample 1 was rather similar to uncoated HDPE, which is expected in view of the chemical similarity of polyethylene and reaction products of 1 -octyne.

Based on the static contact angles measured for water, formamide and diiodomethane, the surface free energy as well as its polar and dispersive components were calculated for uncoated and coated HDPE according to Reference Example 3, giving the values listed in Table 8 and displayed as bar plot in Fig. 3. Table 8

Surface free energy, with disperse and polar components, as determined according to Reference Example 3 from the static contact angles measured for water, formamide and diiodomethane on HDPE after plasma-assisted deposition of different precursors at atmospheric pressure according to the present invention (Samples) and selected comparative samples (CompX).

In line with the individual static contact angles, the calculated surface free energies showed that plasma-assisted deposition of reaction products of fluorine-free polar compounds on HDPE substrates resulted in a substantial increase in surface energy (48-73 mN/m for Samples 2-10, as compared to <35 mN/m for Compl - Comp 5), which was mainly caused by an increased polar component of surface energy (10-35 mN/m for Samples 2-10, as compared to <5 mN for Compl - Comp5). Again, coatings formed from reaction products of 1 -octyne (Sample 1) were a reasonable exception, with surface energy profiles being very similar to uncoated HDPE (Compl).

Example 6: Barrier properties of HDPE substrates after plasma-assisted coating

The effect of the coating of HDPE substrates with reaction products of different fluorine-free precursors via plasma-assisted deposition at atmospheric pressure -i.e. the samples of Example 1- and at low pressure -i.e. the samples of Example 2- on the barrier properties against toluene vapor was assessed by inverse gas chromatography as described by Reference Example 6. For comparison, also the respective uncoated HDPE substrates (Compl for atmospheric pressure and Comp6 for low pressure), HDPE coated with silane precursors by plasma-assisted deposition at atmospheric pressure (Comp2) and commercial HDPE containers with different barrier technologies (Comp3, Comp4, Comp5) were also analyzed. -M-

Values obtained for the three physical parameters characterizing the barrier performance (as described in Reference Example 6) are listed in Table 9 for selected coatings according to the present invention (Samples) and the different comparative samples (CompX). Corresponding bar plots for the three parameters are shown in Fig. 5, 6 and 7.

Table 9

Monolayer binding capacities (PBET), BET constants (CBET) and characteristic retention times (tp.end) determined for the interaction of toluene vapor with uncoated and coated HDPE by means of inverse gas chromatography according to Reference Example 6. The relative pressure range used for evaluation of the adsorption isotherms according to the BET theory was 0.01 < p/p ₀ 0.05.

The collected data showed that monolayer capacities for toluene binding were reduced - relative to untreated HDPE - by coatings with fluorine-free compounds according to the present invention at atmospheric pressure (Samples 1-10) to a similar extent (e.g. (qBET = 0.53 pmol/cm ² for coatings based on epsilon-caprolactam, Sample 4) as well as for comparative coatings made from a fluorine-containing compounds such as Freon R-134a (QBET = 0.47 pmol/cm ² , Comp3) or F ₂ gas (qBET = 0.50 pmol/cm ² , Comp4) as well as an HDPE packaging material with PA-based barrier technology (qBET = 0.50 pmol/cm ² , Comp5). Compared to an uncoated substrate (Compl), which has a q _B ET value of 2.02 pmol/cm ² , the monolayer capacity was improved (i.e. further reduced) by the coating with fluorine-free compounds according to the invention by at least 30 %, preferably by at least 50 %. CBET values of the coatings made from fluorine-free compounds at atmospheric pressure according to the invention were in the same range as CBET values of a comparative coating made from a fluorine-containing compound such as Freon R-134a or F ₂ gas, which had CBET values in the range of from 70 to 90, and HDPE packaging material with PA-based barrier technology (CBET = 80). Again, these values were considerably lower than observed for the respective uncoated HDPE (220) or substrates treated with TMS at atmospheric pressure (495), with Samples 5 and 8 as exceptions. Analogous trends and conclusions could also be inferred from the characteristic retention times, which were significantly shorter for coatings made from fluorine-free compounds at atmospheric pressure according to the present invention (except for Samples 5 and 8 with gammabutyrolactone and PVP, respectively, as precursors) and fluorine-containing compounds and PA-based barriers, as compared to uncoated and TMS-treated HDPE.

Coatings obtained with fluorine-free compounds according to the present invention at low pressure (Samples 11 and 12) essentially provided the same beneficial effects when compared to a corresponding uncoated HDPE bottle (Comp6): monolayer capacities for toluene binding were reduced from 1.45 pmol/cm ² to 0.53 pmol/cm ² and 0.52 pmol/cm ² , respectively (which corresponds to an improvement of ca. 63 %), while similarly strong decreases were also observed for the CBET values and the characteristic retention times. This showed that comparable levels of barrier performance could be achieved via plasma-assisted deposition of reaction products of different fluorine-free compounds at atmospheric and low pressures according to the present invention.

Example 7: Thickness of coatings obtained by plasma-assisted deposition on HDPE

The thickness of the coatings formed on HDPE substrates with reaction products of different fluorine-free compounds via plasma-assisted deposition at atmospheric pressure -i.e. selected samples of Example 1- was assessed by TEM analysis as described by Reference Example 7. Representative TEM images of cross-sections prepared from HDPE substrates coated with 1- octyne, epsilon-caprolactam, vinylacetate and delta-valerolactone are shown in Fig. 8. The images demonstrate that closed and dense layers of the reaction products of the fluorine-free compounds were formed with all selected precursors, yielding coatings with a thickness in the range of 20 to 500 nm, preferably in the range of from 50 to 350 nm, more preferably in the range of from 50 to 200 nm.

Example 8: Roughness of coatings obtained by plasma-assisted deposition on HDPE

The roughness of the coatings formed on HDPE substrates with reaction products of different fluorine-free compounds via plasma-assisted deposition at atmospheric pressure -i.e. selected samples of Example 1- was determined by AFM according to Reference Example 8. The resulting values for the arithmetic mean roughness (Ra) and the root mean square (RMS) roughness (Rq) are listed in Table 10, while the corresponding topographical images are shown in Fig. 9. For comparison, roughness values of selected comparative samples are also included in Table 10.

Table 10 Values for the arithmetic mean roughness (Ra) and the root mean square (RMS) roughness (Rq) determined for the surface of inventive and comparative samples (obtained via plasma- assisted deposition at atmospheric conditions) by means of atomic force microscopy as described in Reference Example 8.

The AFM images in Fig. 9 showed that plasma-assisted deposition led to the formation of closed nanostructured coatings consisting of multiple particulate domains with individual sizes in a typical range of 50-150 nm. This structure resulted in Ra values ranging from 17 to 73 nm and Rq values ranging from 24 to 125 nm, which are significantly higher than the uncoated HDPE reference (Compl). Comparative samples with surface coatings (Comp2 - Comp5) showed slightly lower roughness, with Ra values ranging from 20 to 57 nm and Rq values ranging from 25 to 72 nm.

Example 9: Mechanical properties of coatings obtained by plasma-assisted deposition on HDPE

The elastic modulus and hardness of the coatings formed on pretreated HDPE substrates with reaction products of 1 -octyne via plasma-assisted deposition at atmospheric pressure -i.e. Sample 1 of Example 1- was determined by nanoindentation according to Reference Example

9. For comparison, a HDPE substrate coated only with reaction products of acetylene on its surface -i.e. the “pretreated substrate” described in Reference Example 1- was investigated in the same way. AFM images acquired from cross-sections of the two samples are shown in Fig.

10, where the surface coatings and the bulk HDPE material are clearly visible on the respective left and right sides. Nanoindentation measurements performed on the bulk material in the crosssections gave typical values for the elastic modulus and hardness of (1 .18 ± 0.08) GPa and (0.036 ± 0.002) GPa, respectively, as expected for HDPE - for data expected, reference is made to S. K. Sahu et aL, Materials Chemistry and Physics, Vol. 203, 1 January 2018, pages 173-184. Fig. 11 and Fig. 12 show depth-dependent profiles of the elastic modulus and hardness, respectively, determined by nanoindentation measurements in the CSM mode for Sample 1 and the pretreated substrate in their intact state, as described in Reference Example 9. The collected data revealed that neither the elastic modulus nor the hardness change significantly (within the given limits of experimental error) at the coated surfaces as compared to the HDPE bulk material. This demonstrated that the coatings obtained according to the present invention were soft and elastic and thus fundamentally dissimilar to other carbonaceous coatings described in the literature, especially films of “diamond-like carbon” (DLC), which exhibited much higher elastic modulus (50-250 GPa) and hardness (10-40 GPa) in nanoindentation measurements (see Q. Wei et aL, Composites Part B: Engineering, Vol. 30, Issue 7, October 1999, Pages 675-684 or N. Savvides et al. Thin Solid Films, Vol. 228, Issues 1-2, 15 May 1993, Pages 289-292).

Short description of the Figures

Fig. 1 : shows the experimental setup used for iGC measurements of barrier effects against toluene vapor.

(a) Bottom view of the upper plate of the sample cell, with bores for gas inlet and outlet on both ends of a linear notch serving as chromatographic path.

(b) Bottom view of the upper plate of the cell after mounting of a sample stripe.

(c) Top view of the assembled sample cell with PEEK capillaries mounted on the inlet and outlet bore for connection to the GC instrument.

Fig. 2: shows Tof-SIMS spectra of plasma-polyamide (Sample 4) and a conventional polyamide-6 reference (Comp5) (cation detection mode) in the range of 0-500 atomic mass units (amu).

Fig. 3 shows a bar plot comparing average values (with corresponding standard deviations) of static contact angles measured for water, formamide and diiodomethane according to Reference Example 3 on uncoated and coated HDPE (see Table 7 for individual values).

Fig. 4 shows a bar plot comparing values of surface free energy, with its polar and dispersive contributions, derived according to Reference Example 3 from static contact angles of water, formamide and diiodomethane on uncoated and coated HDPE (see Table 8 for individual values).

Fig. 5 shows a bar plot comparing values of the monolayer capacity (QBET) available for adsorption of toluene on uncoated and coated HDPE, as derived by inverse gas chromatography according to Reference Example 6. q _B ET values were obtained by evaluation across a relative pressure range of 0.01 < p/p ₀ < 0.05 (see Table 9 for individual values).

Fig. 6 shows a bar plot comparing values of the BET constant (CBET), i.e. the affinity for adsorption of toluene on uncoated and coated HDPE for adsorption of toluene, derived by inverse gas chromatography according to Reference Example 6. CBET values were obtained by evaluation across a relative pressure range of 0.01 <, p/p ₀ s 0.05 (see Table 9 for individual values).

Fig. 7 shows a bar plot comparing values of the characteristic retention time (t _R , _en d) determined by inverse gas chromatography for the interaction of toluene vapor with uncoated and coated HOPE according to Reference Example 6 (see Table 9 for individual values).

Fig. 8 shows TEM images of cross-sections prepared from HDPE substrates after plasma- assisted coating with reaction products of selected fluorine-free compounds at atmospheric pressure: 1 -octyne (Sample 1), epsilon-caprolactam (Sample 4), vinylacetate (Sample 9) and delta-valerolactone (Sample 7). The samples were coated with a layer of platinum (for contrast reasons) and embedded in a resin prior to cross-sectioning. The outer layer deposited by the plasma process is clearly visible in all cases and can be used to quantify the thickness of the coatings.

Fig. 9 shows AFM height images of the surface of HDPE substrates after plasma-assisted coating with reaction products of selected fluorine-free compounds at atmospheric pressure: 1 -octyne (Sample 1), epsilon-caprolactam (Sample 4), vinylacetate (Sample 9) and delta-valerolactone (Sample 7). For comparison, an image of the HDPE substrate prior to plasma-assisted deposition (Compl ) is also shown. From the topographical information contained in the images, Ra and Rq values (reported in Table 10) were derived as measure for the surface.

Fig. 10 shows AFM phase contrast images of cross-sections prepared by plasma-assisted coating of HDPE substrates with reaction products of acetylene (pretreated substrate defined in Reference Example 1) or successively of acetylene and 1- octyne (Sample 1 ), both at atmospheric pressure. Arrows indicate the coating present on the original surface of the material.

Fig. 11 shows depth-dependent profiles of the elastic modulus determined by nanoindentation measurements in the CSM mode according to Reference Example 9 for Sample 1 (coating with reaction products of 1 -octyne obtained by plasma- assisted deposition at atmospheric pressure, black squares) and a corresponding pretreated substrate without 1 -octyne coating (grey circles). Symbols represent average values of eight independent determinations with their corresponding standard deviation.

Fig. 12 shows depth-dependent profiles of the hardness determined by nanoindentation measurements in the CSM mode according to Reference Example 9 for Sample 1 (coating with reaction products of 1 -octyne obtained by plasma-assisted deposition at atmospheric pressure, black squares) and a corresponding pretreated substrate without 1-octyne coating (grey circles). Symbols represent average values of eight independent determinations with their corresponding standard deviation. Cited Literature

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