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Title:
PLASMA-ENHANCED FUNCTIONALIZATION OF INORGANIC OXIDE SURFACES
Document Type and Number:
WIPO Patent Application WO2005103226
Kind Code:
A3
Abstract:
Methods for producing plasma-treated, functionalized inorganic oxide surfaces are provided. The methods include the steps of subjecting an oxide surface to a plasma to create hydroxyl functionalities on the surface and reacting the hydroxyl functionalities with epoxy group-containing molecules in situ in the absence of plasma. Biomolecules may be immobilized on the resulting functionalized surfaces. The methods may be used to treat a variety of oxide surfaces, including glass, quartz, silica and metal oxides.

Inventors:
DENES FERENCZ S (US)
MANOLACHE SORIN ODISEI (US)
HELGREN JASON M (US)
LAGALLY MAX G (US)
LARSON BRADLEY JAMES (US)
Application Number:
PCT/US2005/006514
Publication Date:
October 26, 2006
Filing Date:
March 02, 2005
Export Citation:
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Assignee:
WISCONSIN ALUMNI RES FOUND (US)
DENES FERENCZ S (US)
MANOLACHE SORIN ODISEI (US)
HELGREN JASON M (US)
LAGALLY MAX G (US)
LARSON BRADLEY JAMES (US)
International Classes:
H05H1/00; C12M1/34; C23C16/00; G01N33/551; G01N33/552; G01N33/553
Domestic Patent References:
WO2001083826A22001-11-08
WO2001096452A22001-12-20
Foreign References:
US20020110932A12002-08-15
US20020128234A12002-09-12
US4822681A1989-04-18
US20030113478A12003-06-19
US6402899B12002-06-11
US20030207099A12003-11-06
Other References:
DENES ET AL.: "Mechanism of RF plasma induced fragmentation of SiCl4 and surface functionalization of polymeric substrates from SiClx species", JOURNAL OF APPLIED POLYMER SCIENCE, vol. 61, 1996, pages 875 - 884, XP000635232, DOI: doi:10.1002/(SICI)1097-4628(19960801)61:5<875::AID-APP21>3.0.CO;2-V
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