Title:
PLASMA ETCHING APPARATUS, DIELECTRIC WINDOW HEATING DEVICE AND SYSTEM
Document Type and Number:
WIPO Patent Application WO/2024/078063
Kind Code:
A1
Abstract:
A plasma etching apparatus, a dielectric window heating device and a system. In the present invention, a heating element is wrapped by a heat conductor; on one hand, the heat of the heating element can be directly transferred to a dielectric window via a lower heat conductor in direct contact with the dielectric window; and on the other hand, part of the heat of the heating element is dissipated via an upper heat conductor located on a side facing away from the dielectric window. Thus, the heat of the heating element can be rapidly dissipated via the heat conductor, thus avoiding the accumulation phenomenon.
Inventors:
CHEN SHUAI (CN)
LIU HAIYANG (CN)
LIU XIAOBO (CN)
LI HAO (CN)
LI BAISHUN (CN)
HU DONGDONG (CN)
XU KAIDONG (CN)
LIU HAIYANG (CN)
LIU XIAOBO (CN)
LI HAO (CN)
LI BAISHUN (CN)
HU DONGDONG (CN)
XU KAIDONG (CN)
Application Number:
PCT/CN2023/105501
Publication Date:
April 18, 2024
Filing Date:
July 03, 2023
Export Citation:
Assignee:
JIANGSU LEUVEN INSTR CO LTD (CN)
International Classes:
H01J37/32
Attorney, Agent or Firm:
UNITALEN ATTORNEYS AT LAW CO., LTD. (CN)
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