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Patent Searching and Data


Title:
PLASMA GENERATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/261286
Kind Code:
A1
Abstract:
Provided is a plasma generation device capable of suppressing local formation of a main plasma and forming the main plasma in a uniform surface shape. This plasma generation device (100) comprises main discharge dielectric (150) between a first main discharge electrode (110) provided with a first preliminary discharge electrode (120), and a second main discharge electrode (130) provided with a second preliminary discharge electrode (140). The first preliminary discharge electrode (120) is formed in the shape of a long rod in which a conductor (121) is accommodated in a preliminary discharge dielectric (122) made of a glass tube. The first main discharge electrode (110) is composed of a plate-shaped body extending along the first preliminary discharge electrode (120). A groove-shaped preliminary discharge electrode accommodating portion (112) for accommodating the first preliminary discharge electrode (120) in an exposed state is formed on a main electrode facing surface (111) of the first main discharge electrode (110). The main discharge dielectric (150) is composed of a sheet-shaped non-conductor, and is disposed at a position adjacent to the first preliminary discharge electrode (120).

Inventors:
KAWAMURA NAOHISA (JP)
NAGATSU MASAAKI (JP)
Application Number:
PCT/JP2021/022245
Publication Date:
December 30, 2021
Filing Date:
June 11, 2021
Export Citation:
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Assignee:
KUMETA MFG CO LTD (JP)
UNIV SHIZUOKA NAT UNIV CORP (JP)
International Classes:
H05H1/24
Foreign References:
JP2019087395A2019-06-06
JP2007294292A2007-11-08
JP2019061759A2019-04-18
JPH0799351A1995-04-11
JP2002151295A2002-05-24
US20080138534A12008-06-12
Attorney, Agent or Firm:
ITO Hiroyuki (JP)
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