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Patent Searching and Data


Title:
PLASMA PROCESS SYSTEM FOR MULTI-STATION
Document Type and Number:
WIPO Patent Application WO/2023/128627
Kind Code:
A1
Abstract:
According to one embodiment of the present specification, provided is a plasma process system for a multi-station, comprising: a process chamber including at least two stations; one plasma generator per station; one inverter per plasma generator; a sensing unit for measuring electric properties of each plasma generator; and a controller acquiring sensing data from the sensing unit in order to control each inverter.

Inventors:
UHM SAE HOOON (KR)
JEGAL DONG (KR)
SOHN YEONGHOON (KR)
CHOE GYUENG HYUEN (KR)
PARK SE HONG (KR)
HUH JIN (KR)
Application Number:
PCT/KR2022/021551
Publication Date:
July 06, 2023
Filing Date:
December 28, 2022
Export Citation:
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Assignee:
EN2CORE TECH INC (KR)
International Classes:
H01J37/32
Foreign References:
KR20100053531A2010-05-20
KR20140139621A2014-12-05
US20100194279A12010-08-05
US20170365907A12017-12-21
US20070080140A12007-04-12
Attorney, Agent or Firm:
IPLAY PATENT LAW FIRM (KR)
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