Title:
PLASMA PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/091860
Kind Code:
A1
Abstract:
This plasma processing device includes: a processing vessel inside which a substrate to be subjected to plasma processing is placed; a plasma generating unit for generating plasma in the processing vessel; a focusing unit which is disposed in the processing vessel, and which focuses a plurality of ions in the plasma and outputs an ion beam; and a selecting unit which selects specific ions to be supplied to the substrate, from the ion beam output from the focusing unit.
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Inventors:
MORIYA TSUYOSHI (JP)
HIMURA HARUHIKO (JP)
HIMURA HARUHIKO (JP)
Application Number:
PCT/JP2021/038547
Publication Date:
May 05, 2022
Filing Date:
October 19, 2021
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
KYOTO INST TECH (JP)
KYOTO INST TECH (JP)
International Classes:
H01J37/05; H01J27/16; H01J37/08; H01J37/12; H05H1/46
Foreign References:
| JP2001028342A | 2001-01-30 | |||
| JP2012004012A | 2012-01-05 | |||
| JP2009253250A | 2009-10-29 | |||
| JP2003257348A | 2003-09-12 | |||
| US20030127049A1 | 2003-07-10 | |||
| JP2007073534A | 2007-03-22 |
Attorney, Agent or Firm:
SAKAI INTERNATIONAL PATENT OFFICE (JP)
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