Title:
PLASMA PROCESSING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2000/059019
Kind Code:
A1
Abstract:
A plasma processing system comprises an airtight process chamber; a lower electrode arranged to move freely in vertical directions in the process chamber and having a stage for holding an object to be processed; a power supply for supplying high-frequency power to the lower electrode; a lift for moving the lower electrode vertically; a conductive wall structure extending to the floor of the process chamber while substantially enclosing the lift at close distance; and a conductive material arranged around the lower electrode for electrically connecting the wall structure with the inner wall of the process chamber.
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Inventors:
SUEMASA TOMOKI (JP)
INAZAWA KOUICHIRO (JP)
ONO TSUYOSHI (JP)
INAZAWA KOUICHIRO (JP)
ONO TSUYOSHI (JP)
Application Number:
PCT/JP2000/002081
Publication Date:
October 05, 2000
Filing Date:
March 31, 2000
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
SUEMASA TOMOKI (JP)
INAZAWA KOUICHIRO (JP)
ONO TSUYOSHI (JP)
SUEMASA TOMOKI (JP)
INAZAWA KOUICHIRO (JP)
ONO TSUYOSHI (JP)
International Classes:
H01L21/302; B01J19/08; H01J37/32; H01L21/3065; H05H1/46; (IPC1-7): H01L21/3065
Foreign References:
| JPH1032171A | 1998-02-03 | |||
| JPH10237675A | 1998-09-08 | |||
| JPH06333879A | 1994-12-02 | |||
| JPH05226296A | 1993-09-03 | |||
| EP0887836A2 | 1998-12-30 |
Attorney, Agent or Firm:
Suzuye, Takehiko (Kasumigaseki 3-chome Chiyoda-ku, Tokyo, JP)
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