Title:
PLASMA PROCESSOR WITH COIL RESPONSIVE TO VARIABLE AMPLITUDE RF ENVELOPE
Document Type and Number:
WIPO Patent Application WO2001001443
Kind Code:
B1
Abstract:
A vacuum plasma processor includes a coil for reactively exciting a plasma so plasma incident on a workpiece has substantially uniformity. The coil and a window which reactively couples fields from the coil to the plasma have approximately the same diameter. An r.f. source supplies a pulse amplitude modulated envelope including an r.f. carrier to the coil.
Inventors:
HOLLAND JOHN
Application Number:
PCT/US2000/017088
Publication Date:
February 08, 2001
Filing Date:
June 22, 2000
Export Citation:
Assignee:
LAM RES CORP (US)
International Classes:
H05H1/46; H01J37/32; H01L21/302; H01L21/3065; (IPC1-7): H01J37/32
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