Title:
PLASMA-RESISTANT GLASS, INNER CHAMBER-COMPONENT FOR SEMICONDUCTOR MANUFACTURING PROCESS, AND MANUFACTURING METHODS THEREFOR
Document Type and Number:
WIPO Patent Application WO/2023/063654
Kind Code:
A1
Abstract:
The present invention relates to plasma-resistant glass, an inner chamber-component for a semiconductor manufacturing process, and manufacturing methods therefor, and, specifically, to plasma-resistant glass, an inner chamber-component for a semiconductor manufacturing process, and manufacturing methods therefor, the glass having a low melting point implemented by controlling the amount of plasma-resistant glass ingredients, having a lowered coefficient of thermal expansion so that, when used at a high temperature, damage thereto caused by thermal shock can be prevented, and having improved light transmittance and durability.
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Inventors:
KIM DAE GUN (KR)
LEE KYUNG MIN (KR)
SEOK HYE WON (KR)
NA HYE IN (KR)
LEE MUN KI (KR)
LEE KYUNG MIN (KR)
SEOK HYE WON (KR)
NA HYE IN (KR)
LEE MUN KI (KR)
Application Number:
PCT/KR2022/015114
Publication Date:
April 20, 2023
Filing Date:
October 07, 2022
Export Citation:
Assignee:
IONES CO LTD (KR)
International Classes:
C03C4/20; C03B11/06; C03B25/00; C03C3/085; C03C3/091; H01L21/67
Domestic Patent References:
| WO2008018682A1 | 2008-02-14 |
Foreign References:
| KR20090056391A | 2009-06-03 | |||
| KR20210081771A | 2021-07-02 | |||
| KR20140141045A | 2014-12-10 | |||
| CN109111120A | 2019-01-01 |
Attorney, Agent or Firm:
PCR INTELLECTUAL PROPERTY LAW FIRM (KR)
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